Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD11B1 | P28845 | 4/20 | 0.44 |
| ▸ | GPR3 | P46089 | 2/20 | 0.43 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.39 |
| ▸ | TSHR | P16473 | 1/20 | 0.39 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.39 |
| ▸ | ACHE | P22303 | 7/20 | 0.38 |
| ▸ | KCNH2 | Q12809 | 6/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Trifluoromethanesulfonic Acid SCHEMBL9179773 | 0.92 | HSD11B1 (0.40) | HSD11B1GPR3ALDH1A1TSHRTDP1 | |
| Trifluoromethanesulfonic Acid SCHEMBL1813934 | 0.90 | HSD11B1 (0.40) | HSD11B1GPR3ALDH1A1TSHRTDP1 | |
| SCHEMBL7896348 | 0.87 | ALDH1A1 (0.39) | HSD11B1ALDH1A1TSHRTDP1 | |
| SCHEMBL30897218 | 0.84 | HSD11B1 (0.39) | HSD11B1 | |
| SCHEMBL2634848 | 0.84 | HSD11B1 (0.39) | HSD11B1 | |
| SCHEMBL31627575 | 0.83 | CA2 (0.38) | HSD11B1 | |
| SCHEMBL956713 | 0.83 | CA2 (0.38) | HSD11B1 | |
| SCHEMBL31290711 | 0.81 | ALDH1A1 (0.39) | HSD11B1ALDH1A1TSHRTDP1 | |
| SCHEMBL2634259 | 0.81 | ALDH1A1 (0.39) | HSD11B1ALDH1A1TSHRTDP1 | |
| SCHEMBL5412875 | 0.80 | NR1I2 (0.35) | HSD11B1ALDH1A1TSHRTDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 105 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7300741-B2 | For printing features having a dimension of about 30 nm or less; resist is developable in an aqueous alkaline developer | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2007-11-27 | — | — | US | claimed |
| US-20070248908-A1 | ADVANCED CHEMICALLY AMPLIFIED RESIST FOR SUB 30NM DENSE FEATURE RESOLUTION | INTERNATIONAL BUSINESS MACHINES (US) | 2007-10-25 | — | — | US | claimed |
| EP-0543762-B1 | Dry developable photoresist compositions and method for use thereof | IBM (US) | 2000-02-16 | — | — | EP | claimed |
| US-5322765-A | Dry developable photoresist compositions and method for use thereof | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1994-06-21 | — | — | US | claimed |
| EP-0543762-A1 | Dry developable photoresist compositions and method for use thereof | International Business Machines Corporation (US) | 1993-05-26 | — | — | EP | claimed |
| EP-2427801-B1 | FUNCTIONALIZED PERFLUOROPOLYETHER MATERIAL AS A HYDROPHOBIC COATING | HEWLETT PACKARD DEVELOPMENT CO LP (US) | 2017-08-09 | — | — | EP | disclosed |
| US-9188857-B2 | Resist polymer, process for production thereof, resist composition, and process for production of substrates with patterns thereon | MITSUBISHI RAYON CO., LTD. (JP) | 2015-11-17 | — | — | US | disclosed |
| US-8614283-B2 | Resist polymer, resist composition, process for pattern formation, and starting compounds for production of the resist polymer | MITSUBISHI RAYON CO., LTD. (JP) | 2013-12-24 | — | — | US | disclosed |
| US-8580481-B2 | Resist polymer and resist composition | MITSUBISHI RAYON CO., LTD. (JP) | 2013-11-12 | — | — | US | disclosed |
| US-20130252181-A1 | RESIST POLYMER, PROCESS FOR PRODUCTION THEREOF, RESIST COMPOSITION, AND PROCESS FOR PRODUCTION OF SUBSTRATES WITH PATTERNS THEREON | MITSUBISHI RAYON CO., LTD. (JP) | 2013-09-26 | — | — | US | disclosed |
| US-8512935-B2 | Functionalized perfluoropolyether material as a hydrophobic coating | HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. (US) | 2013-08-20 | — | — | US | disclosed |
| US-8476401-B2 | Resist polymer, process for production thereof, resist composition, and process for production of substrated with patterns thereon | MITSUBISHI RAYON CO., LTD. (JP) | 2013-07-02 | — | — | US | disclosed |
| US-5332648-A | Alklali soluble phenolic polymer, cyclic ester or sulfonate which converts to the acid, an onium salt which generates an an acid on exposure to radiation | KABUSHIKI KAISHA TOSHIBA (JP) | 1994-07-26 | — | — | US | disclosed |
| US-5326675-A | Pattern forming method including the formation of an acidic coating layer on the radiation-sensitive layer | KABUSHIKI KAISHA TOSHIBA (JP) | 1994-07-05 | — | — | US | disclosed |
| US-5322765-A | Dry developable photoresist compositions and method for use thereof | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1994-06-21 | — | — | US | disclosed |
| US-5296332-A | Crosslinkable aqueous developable photoresist compositions and method for use thereof | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1994-03-22 | — | — | US | disclosed |
| EP-0543762-A1 | Dry developable photoresist compositions and method for use thereof | International Business Machines Corporation (US) | 1993-05-26 | — | — | EP | disclosed |
| EP-0543761-A1 | Crosslinkable aqueous developable photoresist compositions and method for use thereof | International Business Machines Corporation (US) | 1993-05-26 | — | — | EP | disclosed |
| US-5091282-A | Comprising a 4-oxo-p-dioxin or a C5-6 carbcyclic fused derivative and a phenolic resin or a hydroxyl-containing polysiloxane or -silane; photoresists using short wavelengths of UV; sharpness | KABUSHIKI KAISHA TOSHIBA (JP) | 1992-02-25 | — | — | US | disclosed |
| EP-0396254-A2 | Photosensitive composition and pattern formation method using the same | KABUSHIKI KAISHA TOSHIBA (JP) | 1990-11-07 | — | — | EP | disclosed |