SCHEMBL22097536

SCHEMBL22097536

O=C(NS(=O)(=O)C(F)(F)F)c1cccc(OC(=O)c2c(I)ccc(I)c2I)c1

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ KAT6A Q92794 5/20 0.39
▸ HDAC8 Q9BY41 2/20 0.35
▸ CYP1A2 P05177 2/20 0.35
▸ CYP3A4 P08684 2/20 0.35
▸ CYP2C19 P33261 2/20 0.35
▸ GAA P10253 1/20 0.35
▸ MAPT P10636 1/20 0.35
▸ CYP2C9 P11712 1/20 0.35
▸ RAB9A P51151 2/20 0.34
▸ SMN1; SMN2 Q16637 2/20 0.34
▸ NPC1 O15118 1/20 0.34
▸ POLB P06746 1/20 0.34
▸ HTT P42858 1/20 0.34
▸ MEN1 O00255 1/20 0.34
▸ KMT2A Q03164 1/20 0.34
▸ BCL2L1 Q07817 1/20 0.34
▸ MCL1 Q07820 1/20 0.34
▸ DDR1 Q08345 2/20 0.34
▸ CYP2D6 P10635 1/20 0.34
▸ TAS1R3 Q7RTX0 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22097535 0.86 TRPV1 (0.37) MEN1KMT2ABCL2L1MCL1SCN5A
SCHEMBL26343825 0.83 KAT6A (0.38) KAT6AHDAC8CYP1A2CYP3A4CYP2C19
SCHEMBL22097548 0.76 MAPK1 (0.35) SMN1; SMN2MCL1SCN5ASCN9A
SCHEMBL22789845 0.74 KAT6A (0.49) KAT6AMAPTRAB9AMEN1KMT2A
SCHEMBL22789846 0.72 RXFP1 (0.39) SMN1; SMN2MEN1KMT2AMCL1SCN5A
SCHEMBL21500899 0.71 CYP3A4 (0.51) CYP3A4NPC1POLBMEN1KMT2A
SCHEMBL22097549 0.70 KMT2A (0.36) GAASMN1; SMN2POLBHTTMEN1
SCHEMBL21705805 0.70 KMT2A (0.43) CYP3A4MAPTSMN1; SMN2POLBMEN1
SCHEMBL22945088 0.70 LMNA (0.54) CYP1A2CYP3A4CYP2C19GAAMAPT
SCHEMBL26343816 0.70 TRPV1 (0.40) HDAC8MAPTRAB9ASMN1; SMN2NPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11774853-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-10-03 — — US disclosed
US-11774853-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-10-03 — — US disclosed
US-20200192222-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-06-18 — — US disclosed
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