SCHEMBL22097549

SCHEMBL22097549

O=C(COC(=O)c1c(I)ccc(I)c1I)NS(=O)(=O)C(F)(F)F

nearest known ligand 0.36

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ KMT2A Q03164 3/20 0.36
▸ HPGD P15428 3/20 0.36
▸ ALDH1A1 P00352 3/20 0.36
▸ MEN1 O00255 2/20 0.36
▸ KDM4E B2RXH2 2/20 0.36
▸ L3MBTL1 Q9Y468 1/20 0.36
▸ GAA P10253 2/20 0.33
▸ NPSR1 Q6W5P4 1/20 0.33
▸ MMP2 P08253 2/20 0.33
▸ MMP9 P14780 2/20 0.33
▸ MMP12 P39900 2/20 0.33
▸ LMNA P02545 2/20 0.33
▸ POLB P06746 2/20 0.33
▸ TDP1 Q9NUW8 2/20 0.31
▸ PLA2G10 O15496 1/20 0.31
▸ TP53 P04637 1/20 0.31
▸ SMN1; SMN2 Q16637 1/20 0.31
▸ TSHR P16473 1/20 0.31
▸ AKR1C3 P42330 1/20 0.31
▸ AKR1C2 P52895 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22097546 0.87 MMP2 (0.32) MMP2MMP9MMP12AKR1C3
SCHEMBL22097551 0.85 CXCR2 (0.34) MMP2MMP9MMP12
SCHEMBL24361340 0.78 LMNA (0.45) KMT2AHPGDALDH1A1MEN1LMNA
SCHEMBL22097548 0.77 MAPK1 (0.35) SMN1; SMN2
SCHEMBL26343812 0.77 HDAC3 (0.36) KMT2AHPGDALDH1A1MEN1KDM4E
SCHEMBL22097535 0.73 TRPV1 (0.37) KMT2AMEN1AKR1C3AKR1C2
SCHEMBL29346576 0.72 — —
SCHEMBL22097538 0.72 VCP (0.35) NPSR1LMNASMN1; SMN2
SCHEMBL22097536 0.70 KAT6A (0.39) KMT2AMEN1GAAPOLBSMN1; SMN2
SCHEMBL22503060 0.69 FAAH (0.39) HPGDALDH1A1MMP2MMP9MMP12

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11774853-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-10-03 — — US disclosed
US-11774853-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-10-03 — — US disclosed
US-20200192222-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-06-18 — — US disclosed
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