SCHEMBL22097535

SCHEMBL22097535

O=C(NS(=O)(=O)C(F)(F)F)c1ccc(OC(=O)c2c(I)ccc(I)c2I)cc1

nearest known ligand 0.37

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ TRPV1 Q8NER1 3/20 0.37
▸ SCN5A Q14524 1/20 0.35
▸ SCN9A Q15858 1/20 0.35
▸ MEN1 O00255 2/20 0.34
▸ KMT2A Q03164 2/20 0.34
▸ PRSS1 P07477 1/20 0.33
▸ ACR P10323 1/20 0.33
▸ VCP P55072 1/20 0.33
▸ PTPN1 P18031 2/20 0.32
▸ ALOX15 P16050 1/20 0.31
▸ GFER P55789 1/20 0.31
▸ ADAM17 P78536 1/20 0.31
▸ PIN1 Q13526 1/20 0.31
▸ PTGFR P43088 1/20 0.31
▸ TLR7 Q9NYK1 1/20 0.31
▸ ELANE P08246 1/20 0.31
▸ PRTN3 P24158 1/20 0.31
▸ BCL2L1 Q07817 1/20 0.31
▸ MCL1 Q07820 1/20 0.31
▸ AKR1C3 P42330 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22097536 0.86 KAT6A (0.39) SCN5ASCN9AMEN1KMT2ABCL2L1
SCHEMBL26343816 0.80 TRPV1 (0.40) TRPV1SCN5ASCN9AMEN1KMT2A
SCHEMBL22097548 0.80 MAPK1 (0.35) SCN5ASCN9AVCPPTPN1PTGFR
SCHEMBL22503310 0.76 KMT2A (0.51) SCN5ASCN9AMEN1KMT2AELANE
SCHEMBL22503069 0.74 ELANE (0.55) SCN5ASCN9AELANEPRTN3
SCHEMBL22503119 0.74 TRPV1 (0.50) TRPV1SCN5ASCN9AVCPPTPN1
SCHEMBL22097549 0.73 KMT2A (0.36) MEN1KMT2AAKR1C3AKR1C2
SCHEMBL22503139 0.73 CA1 (0.59) MEN1KMT2AALOX15GFER
SCHEMBL21500866 0.73 KIF11 (0.37) MEN1KMT2APRSS1ACRTLR7
SCHEMBL21500892 0.71 MAPT (0.38) MEN1KMT2AALOX15GFERELANE

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11774853-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-10-03 — — US disclosed
US-11774853-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-10-03 — — US disclosed
US-20200192222-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-06-18 — — US disclosed
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