Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 1/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.33 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.33 |
| ▸ | VCP | P55072 | 1/20 | 0.31 |
| ▸ | SERPINE1 | P05121 | 1/20 | 0.31 |
| ▸ | LOXL2 | Q9Y4K0 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL22097538 | 0.87 | VCP (0.35) | LMNAMAPTSMN1; SMN2NPSR1VCP | |
| SCHEMBL26343823 | 0.83 | SERPINE1 (0.32) | VCPSERPINE1LOXL2 | |
| SCHEMBL22166144 | 0.71 | — | — | |
| SCHEMBL22503049 | 0.70 | HDAC8 (0.39) | SMN1; SMN2VCP | |
| SCHEMBL26343818 | 0.70 | VCP (0.35) | VCP | |
| SCHEMBL22097548 | 0.69 | MAPK1 (0.35) | SMN1; SMN2VCP | |
| SCHEMBL22097549 | 0.69 | KMT2A (0.36) | LMNASMN1; SMN2NPSR1 | |
| SCHEMBL24465304 | 0.68 | TP53 (0.32) | VCP | |
| SCHEMBL22503052 | 0.67 | HDAC8 (0.43) | LMNASMN1; SMN2VCP | |
| SCHEMBL26353754 | 0.66 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11774853-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-10-03 | — | — | US | disclosed |
| US-11774853-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-10-03 | — | — | US | disclosed |
| US-20200192222-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-06-18 | — | — | US | disclosed |