SCHEMBL26353754

SCHEMBL26353754

O=C(OC1C2OC3C(OC(=O)C13)C2C(=O)NS(=O)(=O)C(F)(F)F)c1c(I)ccc(I)c1I

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26343827 0.85 — —
SCHEMBL22097537 0.83 — —
SCHEMBL22097457 0.72 — —
SCHEMBL26343821 0.69 — —
SCHEMBL22097538 0.69 VCP (0.35) —
SCHEMBL22097539 0.66 LMNA (0.33) —
SCHEMBL22097548 0.65 MAPK1 (0.35) —
SCHEMBL22097549 0.65 KMT2A (0.36) —
SCHEMBL22097546 0.63 MMP2 (0.32) —
SCHEMBL22097535 0.62 TRPV1 (0.37) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11774853-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-10-03 — — US disclosed
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