SCHEMBL22137296

SCHEMBL22137296

CC1CC2(CCC(C3CC3)CC2)OC1=O

nearest known ligand 0.32

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
RORC P51449 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22131545 0.83 HSD11B1 (0.40)
SCHEMBL12440638 0.80 KDM4E (0.36) RORC
SCHEMBL9966022 0.76 KMT2A (0.40) RORC
SCHEMBL9963261 0.72 CYP2D6 (0.34) RORC
SCHEMBL9328446 0.68 SMN1; SMN2 (0.31)
SCHEMBL9717735 0.66
SCHEMBL14272279 0.66
SCHEMBL20510694 0.63
SCHEMBL9674198 0.61 LMNA (0.33)
SCHEMBL7294281 0.61 KDM4E (0.33)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2020129476-A1 ACTIVE-LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMATION METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE 富士フイルム株式会社 2020-06-25 WO disclosed