Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4141826 | 0.88 | TET2 (0.42) | TET2 | |
| SCHEMBL2115995 | 0.79 | TET2 (0.33) | TET2 | |
| SCHEMBL2311055 | 0.79 | ALDH1A1 (0.46) | — | |
| SCHEMBL28694979 | 0.79 | TET2 (0.45) | TET2 | |
| SCHEMBL156151 | 0.77 | ALDH1A1 (0.50) | TET2TBXAS1 | |
| SCHEMBL2113358 | 0.77 | TET2 (0.32) | TET2 | |
| SCHEMBL11126565 | 0.76 | TSHR (0.39) | TET2TBXAS1 | |
| SCHEMBL4087831 | 0.74 | EPHX2 (0.38) | TET2TBXAS1 | |
| SCHEMBL1007351 | 0.74 | TBXAS1 (0.36) | TET2TBXAS1 | |
| SCHEMBL7097731 | 0.74 | SOAT1 (0.33) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9733564-B2 | Copolymers for lithography and method for producing same, resist composition, method for producing substrate with pattern formed thereupon, method for evaluating copolymers, and method for analyzing copolymer compositions | MITSUBISHI CHEMICAL CORPORATION (JP) | 2017-08-15 | — | — | US | disclosed |
| US-20130224654-A1 | COPOLYMERS FOR LITHOGRAPHY AND METHOD FOR PRODUCING SAME, RESIST COMPOSITION, METHOD FOR PRODUCING SUBSTRATE WITH PATTERN FORMED THEREUPON, METHOD FOR EVALUATING COPOLYMERS, AND METHOD FOR ANALYZING COPOLYMER COMPOSITIONS | MITSUBISHI RAYON CO., LTD. (JP) | 2013-08-29 | — | — | US | disclosed |
| US-8241829-B2 | Resist polymer, resist composition, process for pattern formation, and starting compounds for production of the resist polymer | MITSUBISHI RAYON CO., LTD. (JP) | 2012-08-14 | — | — | US | disclosed |
| US-8114949-B2 | (Meth)acrylate, polymer and resist composition | MITSUBISHI RAYON CO., LTD. (JP) | 2012-02-14 | — | — | US | disclosed |
| US-8092979-B2 | Resist polymer and resist composition | MITSUBISHI RAYON CO., LTD. (JP) | 2012-01-10 | — | — | US | disclosed |
| US-8088875-B2 | (Meth)acrylate, polymer and resist composition | MITSUBISHI RAYON CO., LTD. (JP) | 2012-01-03 | — | — | US | disclosed |
| US-20090130419-A1 | FOAM SHEET AND PRODUCTION PROCESS THEREOF | OJI PAPER CO., LTD (JP) | 2009-05-21 | — | — | US | disclosed |
| US-20080070998-A1 | Foam Production Method | OJI PAPER CO., LTD. (JP) | 2008-03-20 | — | — | US | disclosed |
| US-20080003529-A1 | (Meth)Acrylate, Polymer and Resist Composition | MITSUBISHI RAYON CO., LTD. (JP) | 2008-01-03 | — | — | US | disclosed |
| US-20070190449-A1 | Resist polymer, resist composition, process for pattern formation, and starting compounds for production of the resist polymer | MITSUBISHI RAYON CO., LTD. (JP) | 2007-08-16 | — | — | US | disclosed |
| EP-1795553-A1 | PROCESS FOR PRODUCING FOAM | Oji Paper Co., Ltd. (JP) | 2007-06-13 | — | — | EP | disclosed |
| US-20060210785-A1 | Foamed product in a sheet form and method for production thereof | OJI PAPER CO., LTD. (JP) | 2006-09-21 | — | — | US | disclosed |
| EP-1647570-A1 | FOAMED PRODUCT IN A SHEET FORM AND METHOD FOR PRODUCTION THEREOF | Oji Paper Co., Ltd. (JP) | 2006-04-19 | — | — | EP | disclosed |
| US-6706826-B1 | COMONOMERS COMPRISING ALICYCLIC AND LACTONE STRUCTURES; HYDROPHOBIC AND HEAT RESISTANCE, SOLVENT SOLUBILITY; PAINTS | MITSUBISHI RAYON CO., LTD. (JP) | 2004-03-16 | — | — | US | disclosed |