SCHEMBL2219441

SCHEMBL2219441

Cc1cc(CO)c(O)c(CO)c1C

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SHBG P04278 1/20 0.48
KDM4E B2RXH2 3/20 0.42
ALDH1A1 P00352 2/20 0.42
HPGD P15428 2/20 0.42
HSD17B10 Q99714 1/20 0.42
MAOA P21397 1/20 0.37
CASP6 P55212 1/20 0.36
LMNA P02545 3/20 0.35
PDXK O00764 3/20 0.34
TRPV4 Q9HBA0 1/20 0.34
HTT P42858 1/20 0.33
CA1 P00915 1/20 0.32
CA2 P00918 1/20 0.32
MEN1 O00255 1/20 0.31
KMT2A Q03164 1/20 0.31
AOX1 Q06278 1/20 0.31
OPRD1 P41143 1/20 0.31
PDCD1 Q15116 1/20 0.31
CD274 Q9NZQ7 1/20 0.31
KLF10 Q13118 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4058032 0.89 SHBG (0.42) SHBGKDM4EALDH1A1HPGDHSD17B10
SCHEMBL8345472 0.83 SHBG (0.42) SHBGKDM4EALDH1A1HPGDHSD17B10
SCHEMBL7522113 0.83 SHBG (0.48) SHBGKDM4EALDH1A1HPGDHSD17B10
Methane SCHEMBL2219454 0.83 SHBG (0.39) SHBGKDM4EALDH1A1HPGDHSD17B10
Methane SCHEMBL27839244 0.83 SHBG (0.39) SHBGKDM4EALDH1A1HPGDHSD17B10
SCHEMBL2219190 0.83 SHBG (0.44) SHBGKDM4EALDH1A1HPGDHSD17B10
SCHEMBL27684351 0.82 SHBG (0.38) SHBGKDM4EALDH1A1HPGDHSD17B10
SCHEMBL2220860 0.81 SELL (0.43) SHBGKDM4EALDH1A1HPGDHSD17B10
SCHEMBL27984345 0.80 SHBG (0.50) SHBGKDM4EALDH1A1HPGDHSD17B10
SCHEMBL8351608 0.80 SHBG (0.40) SHBGKDM4EALDH1A1HPGDHSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 31 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2025095045-A1 TRANSPARENT RESIN COMPOSITION, DRY FILM, CURED PRODUCT, AND ELECTRONIC COMPONENT 太陽ホールディングス株式会社 2025-05-08 WO disclosed
WO-2025095046-A1 RESIN COMPOSITION, DRY FILM, CURED PRODUCT, AND LIGHT EMITTING ELEMENT MOUNTED SUBSTRATE 太陽ホールディングス株式会社 2025-05-08 WO disclosed
US-9405188-B2 Positive photosensitive resin composition, photosensitive resin film prepared by using the same, and display device SAMSUNG SDI CO., LTD. (KR) 2016-08-02 US disclosed
US-9405188-B2 Positive photosensitive resin composition, photosensitive resin film prepared by using the same, and display device SAMSUNG SDI CO., LTD. (KR) 2016-08-02 US disclosed
EP-2228400-B1 NOVEL POLYIMIDE SILICONE, PHOTOSENSITIVE RESIN COMPOSITION CONTAINING THE NOVEL POLYIMIDE SILICONE, AND METHOD FOR PATTERN FORMATION SHINETSU CHEMICAL CO (JP) 2016-04-27 EP disclosed
US-9298113-B2 Electrophotographic photoconductor, image forming apparatus, and process cartridge RICOH COMPANY, LTD. (JP) 2016-03-29 US disclosed
US-9122183-B2 Electrophotographic photoreceptor, image forming apparatus and process cartridge RICOH COMPANY, LTD. (JP) 2015-09-01 US disclosed
US-9081353-B2 Cleaner, and process cartridge and image forming apparatus using the cleaner RICOH COMPANY, LTD. (JP) 2015-07-14 US disclosed
US-20150177617-A1 Positive Photosensitive Resin Composition, Photosensitive Resin Film Prepared by Using the Same, and Display Device SAMSUNG SDI CO., LTD. (KR) 2015-06-25 US disclosed
US-20150177617-A1 Positive Photosensitive Resin Composition, Photosensitive Resin Film Prepared by Using the Same, and Display Device SAMSUNG SDI CO., LTD. (KR) 2015-06-25 US disclosed
US-20090076310-A1 NOVEL BIS-(HYDROXYBENZALDEHYDE) COMPOUND AND NOVEL POLYNUCLEAR POLYPHENOL COMPOUND DERIVED THEREFROM AND METHOD FOR PRODUCTION THEREOF HONSHU CHEMICAL INDUSTRY CO., LTD. (JP) 2009-03-19 US disclosed
US-7476476-B2 Photosensitive resin composition, electronic component using the same, and display unit using the same TORAY INDUSTRIES, INC. (JP) 2009-01-13 US disclosed
US-20080108723-A1 Photosensitive Resin Composition TORAY INDUSTRIES, INC. (JP) 2008-05-08 US disclosed
US-20080108723-A1 Photosensitive Resin Composition TORAY INDUSTRIES, INC. (JP) 2008-05-08 US disclosed
EP-1375463-A1 OPTICALLY ACTIVE COMPOUND AND PHOTOSENSITIVE RESIN COMPOSITION Kansai Research Institute, Inc. (JP) 2004-01-02 EP disclosed
US-20030211421-A1 Optically active compound and photosensitive resin composition KRI, INC. (JP) 2003-11-13 US disclosed
EP-0769485-B1 Positive resist composition and photosensitizers SUMITOMO CHEMICAL CO (JP) 2002-03-13 EP disclosed
US-6051358-A UNSYMETRICAL PHOTOACTIVE COMPOUND HAVING AT LEAST 2 DIAZOOXYNAPHTHALENESULFONYLOXY GROUPS SHIPLEY COMPANY, L.L.C. (US) 2000-04-18 US disclosed
US-5866724-A Positive resist composition and photosensitizers SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1999-02-02 US disclosed
EP-0769485-A1 Positive resist composition and photosensitizers SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1997-04-23 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20090076310-A1 NOVEL BIS-(HYDROXYBENZALDEHYDE) COMPOUND AND NOVEL POLYNUCLEAR POLYPHENOL COMPOUND DERIVED THEREFROM AND METHOD FOR PRODUCTION THEREOF DDT, PAH, HPD SHBG 4140/4885KDM4E 1703/4885ALDH1A1 356/4885
US-20030211421-A1 Optically active compound and photosensitive resin composition ARCN1, RAD51, PAM SHBG 3960/4885KDM4E 1317/4885ALDH1A1 1552/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.