SCHEMBL22201019

SCHEMBL22201019

C=C(C)C(=O)OC(C)(CC)C1CCCC1

nearest known ligand 0.35

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.34
THRB P10828 1/20 0.33
TSHR P16473 3/20 0.32
GAA P10253 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10242688 0.98 ALDH1A1 (0.33) ALDH1A1THRBTSHRGAA
SCHEMBL16807397 0.97 ALDH1A1 (0.34) ALDH1A1THRBTSHRGAA
SCHEMBL16807393 0.93 ALDH1A1 (0.36) ALDH1A1THRBTSHR
SCHEMBL9609264 0.82 LMNA (0.37) GAA
SCHEMBL22201018 0.81 ALDH1A1 (0.35) ALDH1A1THRBTSHR
SCHEMBL9609262 0.81 LMNA (0.36) ALDH1A1GAA
SCHEMBL171954 0.80 ALDH1A1 (0.34) ALDH1A1THRBTSHR
SCHEMBL8407098 0.80 ALDH1A1 (0.34) ALDH1A1THRBTSHR
SCHEMBL15132675 0.79 PDK1 (0.31)
SCHEMBL25699003 0.79 LMNA (0.30) ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230305398-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-28 US disclosed
US-20230305398-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-28 US disclosed
US-20200218154-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-07-09 US disclosed