Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.63 |
| ▸ | CASP6 | P55212 | 1/20 | 0.63 |
| ▸ | SHBG | P04278 | 1/20 | 0.50 |
| ▸ | MAPT | P10636 | 1/20 | 0.46 |
| ▸ | GABRA1 | P14867 | 1/20 | 0.44 |
| ▸ | GABRB2 | P47870 | 1/20 | 0.44 |
| ▸ | ACHE | P22303 | 1/20 | 0.42 |
| ▸ | DHFR | P00374 | 2/20 | 0.41 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.39 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.39 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.39 |
| ▸ | PKM | P14618 | 1/20 | 0.38 |
| ▸ | BACE1 | P56817 | 1/20 | 0.37 |
| ▸ | HSPA5 | P11021 | 1/20 | 0.37 |
| ▸ | CYP4F2 | P78329 | 1/20 | 0.35 |
| ▸ | CYP4A11 | Q02928 | 1/20 | 0.35 |
| ▸ | TRPV1 | Q8NER1 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11522991 | 0.95 | KDM4E (0.56) | KDM4ECASP6SHBGMAPTGABRA1 | |
| SCHEMBL216792 | 0.88 | KDM4E (0.70) | KDM4ECASP6SHBGMAPTACHE | |
| SCHEMBL2221247 | 0.86 | SHBG (0.54) | KDM4ECASP6SHBGMAPTGABRA1 | |
| Acetic Acid SCHEMBL9330895 | 0.84 | KDM4E (0.61) | KDM4ECASP6SHBGMAPTGABRA1 | |
| Dimethylamine SCHEMBL3843461 | 0.84 | KDM4E (0.59) | KDM4ECASP6SHBGMAPTACHE | |
| SCHEMBL16001171 | 0.84 | GABRA1 (0.46) | KDM4ECASP6SHBGGABRA1GABRB2 | |
| SCHEMBL10821832 | 0.83 | SHBG (0.62) | KDM4ECASP6SHBGMAPTGABRA1 | |
| SCHEMBL31265753 | 0.83 | SHBG (0.62) | KDM4ECASP6SHBGMAPTGABRA1 | |
| SCHEMBL11519916 | 0.82 | KDM4E (0.44) | KDM4ECASP6SHBGMAPTGABRA1 | |
| SCHEMBL15080879 | 0.82 | SHBG (0.45) | KDM4ECASP6SHBGGABRA1GABRB2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 170 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12044968-B2 | Protective film-forming composition having acetal structure and amide structure | NISSAN CHEMICAL CORPORATION (JP) | 2024-07-23 | — | — | US | disclosed |
| US-12044968-B2 | Protective film-forming composition having acetal structure and amide structure | NISSAN CHEMICAL CORPORATION (JP) | 2024-07-23 | — | — | US | disclosed |
| US-12025916-B2 | Resist underlayer film-forming composition that contains triaryldiamine-containing novolac resin to which aromatic vinyl compound is added | NISSAN CHEMICAL CORPORATION (JP) | 2024-07-02 | — | — | US | disclosed |
| US-12025916-B2 | Resist underlayer film-forming composition that contains triaryldiamine-containing novolac resin to which aromatic vinyl compound is added | NISSAN CHEMICAL CORPORATION (JP) | 2024-07-02 | — | — | US | disclosed |
| WO-2024128157-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM | 日産化学株式会社 | 2024-06-20 | — | — | WO | disclosed |
| EP-4310157-A1 | LAMINATE, RELEASE AGENT COMPOSITION, AND METHOD FOR MANUFACTURING MACHINED SEMICONDUCTOR SUBSTRATE | Nissan Chemical Corporation (JP) | 2024-01-24 | — | — | EP | disclosed |
| US-11815815-B2 | Composition for forming silicon-containing resist underlayer film removable by wet process | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2023-11-14 | — | — | US | disclosed |
| US-20230359123-A1 | RESIST UNDERLAYER FILM-FORMING COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2023-11-09 | — | — | US | disclosed |
| US-20230359123-A1 | RESIST UNDERLAYER FILM-FORMING COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2023-11-09 | — | — | US | disclosed |
| US-20230350299-A1 | STEP SUBSTRATE COATING COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2023-11-02 | — | — | US | disclosed |
| US-20110173807-A1 | DISPERSION FOR DISPOSING FINE PARTICLE AT PREDETERMINED POINT ON SUBSTRATE BY INK-JET PRINTING | NATOCO CO., LTD. (JP) | 2011-07-21 | — | — | US | disclosed |
| US-7977400-B2 | polyimide, unsaturated polymerizable compound, photoinitiator; crosslinkable to form addition-condensation copolymer or polyetherimide copolymer; no imidation of polymer through high-temperature heat treatment; alkaline development; polyimide film having excellent heat resistance, strength, elongation | TORAY INDUSTRIES, INC. (JP) | 2011-07-12 | — | — | US | disclosed |
| US-7977400-B2 | polyimide, unsaturated polymerizable compound, photoinitiator; crosslinkable to form addition-condensation copolymer or polyetherimide copolymer; no imidation of polymer through high-temperature heat treatment; alkaline development; polyimide film having excellent heat resistance, strength, elongation | TORAY INDUSTRIES, INC. (JP) | 2011-07-12 | — | — | US | disclosed |
| US-20100316953-A1 | SILOXANE-BASED RESIN COMPOSITION | TORAY INDUSTRIES, INC. (JP) | 2010-12-16 | — | — | US | disclosed |
| US-7476476-B2 | Photosensitive resin composition, electronic component using the same, and display unit using the same | TORAY INDUSTRIES, INC. (JP) | 2009-01-13 | — | — | US | disclosed |
| US-20080108723-A1 | Photosensitive Resin Composition | TORAY INDUSTRIES, INC. (JP) | 2008-05-08 | — | — | US | disclosed |
| US-20080108723-A1 | Photosensitive Resin Composition | TORAY INDUSTRIES, INC. (JP) | 2008-05-08 | — | — | US | disclosed |
| EP-0117759-B1 | POLYNUCLEAR POLYHYDRIC PHENOLS AND PROCESS FOR PREPARATION THEREOF | MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) | 1987-09-30 | — | — | EP | disclosed |
| US-4614826-A | CURABLE TO EPOXY RESINS; HEAT RESISTANCE | MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) | 1986-09-30 | — | — | US | disclosed |
| EP-0117759-A1 | Polynuclear polyhydric phenols and process for preparation thereof | MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) | 1984-09-05 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20100316953-A1 | SILOXANE-BASED RESIN COMPOSITION | ICAM1, ESD, CAD | KDM4E 117/4885CASP6 3132/4885SHBG 3852/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.