Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GPR119 | Q8TDV5 | 7/20 | 0.50 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.46 |
| ▸ | PKM | P14618 | 1/20 | 0.46 |
| ▸ | MEN1 | O00255 | 3/20 | 0.44 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.44 |
| ▸ | PTPN2 | P17706 | 1/20 | 0.44 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.44 |
| ▸ | PTPN6 | P29350 | 1/20 | 0.44 |
| ▸ | STS | P08842 | 1/20 | 0.43 |
| ▸ | NAMPT | P43490 | 1/20 | 0.43 |
| ▸ | POLB | P06746 | 1/20 | 0.42 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL22277395 | 0.89 | GPR119 (0.39) | GPR119KDM4EPKMMEN1KMT2A | |
| SCHEMBL22277450 | 0.81 | MAPT (0.42) | GPR119KDM4EMEN1KMT2APTPN2 | |
| SCHEMBL22277391 | 0.81 | GPR119 (0.44) | GPR119KDM4EPKMKMT2APTPN2 | |
| SCHEMBL22277387 | 0.81 | GPR119 (0.49) | GPR119KDM4EPKMMEN1KMT2A | |
| SCHEMBL22277481 | 0.81 | MAPT (0.41) | GPR119KDM4EMEN1KMT2APTPN2 | |
| SCHEMBL22277407 | 0.79 | MEN1 (0.47) | GPR119KDM4EPKMMEN1KMT2A | |
| SCHEMBL22277402 | 0.79 | PTPN2 (0.43) | MEN1KMT2APTPN2PTPN1 | |
| SCHEMBL22277478 | 0.78 | MAPT (0.39) | GPR119KDM4EMEN1KMT2APTPN2 | |
| SCHEMBL22605678 | 0.77 | KDM4E (0.52) | GPR119KDM4EPKMKMT2APTPN2 | |
| SCHEMBL277247 | 0.76 | PTPN2 (0.47) | MEN1KMT2APTPN2PTPN1ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230129578-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-04-27 | — | — | US | disclosed |
| US-20230129578-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-04-27 | — | — | US | disclosed |
| US-20200241417-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-07-30 | — | — | US | disclosed |