Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TTR | P02766 | 1/20 | 0.42 |
| ▸ | GABRA1 | P14867 | 1/20 | 0.39 |
| ▸ | GABRB1 | P18505 | 1/20 | 0.39 |
| ▸ | GABRB2 | P47870 | 1/20 | 0.39 |
| ▸ | ERN1 | O75460 | 1/20 | 0.31 |
| ▸ | TPMT | P51580 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL21159415 | 0.78 | TTR (0.59) | TTRGABRA1GABRB1GABRB2ERN1 | |
| SCHEMBL7152837 | 0.78 | ADRA2A (0.38) | TTRGABRA1GABRB1GABRB2 | |
| SCHEMBL27106901 | 0.76 | TTR (0.34) | TTRGABRA1GABRB1GABRB2ERN1 | |
| SCHEMBL21263766 | 0.75 | GABRA1 (0.56) | TTRGABRA1GABRB1GABRB2 | |
| SCHEMBL17161274 | 0.71 | GABRA1 (0.41) | TTRGABRA1GABRB1GABRB2 | |
| SCHEMBL22403150 | 0.71 | TTR (0.34) | TTRGABRA1GABRB1GABRB2 | |
| SCHEMBL24218923 | 0.70 | TTR (0.48) | TTRGABRA1GABRB1GABRB2ERN1 | |
| SCHEMBL25479340 | 0.66 | — | — | |
| SCHEMBL22991569 | 0.65 | TTR (0.61) | TTRGABRA1GABRB1GABRB2ERN1 | |
| SCHEMBL4961622 | 0.65 | TTR (0.55) | TTRGABRA1GABRB1GABRB2ERN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240027902-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-01-25 | — | — | US | disclosed |
| US-20220026803-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2022-01-27 | — | — | US | disclosed |
| US-20200241418-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-07-30 | — | — | US | disclosed |