SCHEMBL22287345

SCHEMBL22287345

C[Si](Cl)(Cl)N(C1CCCCC1)[Si](C)(Cl)Cl

nearest known ligand 0.36

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
ADH1A P07327 5/20 0.36
ADH1C P00326 3/20 0.36
PHGDH O43175 2/20 0.32
ADH1B P00325 1/20 0.32
FAAH O00519 1/20 0.32
MGLL Q99685 1/20 0.32
HPGD P15428 1/20 0.31
TSHR P16473 1/20 0.31
GAA P10253 1/20 0.31
S1PR3 Q99500 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22287316 0.97 ADH1A (0.32) ADH1AADH1C
SCHEMBL6859273 0.78 ADH1A (0.39) ADH1AADH1CPHGDHADH1BFAAH
SCHEMBL6857821 0.75 ADH1A (0.35) ADH1AADH1CPHGDHADH1BFAAH
SCHEMBL28260223 0.65 ALDH1A1 (0.53)
SCHEMBL28594750 0.65 ADH1A (0.42) ADH1AADH1CPHGDHADH1BFAAH
SCHEMBL5473432 0.63 NR1H2 (0.31)
SCHEMBL197056 0.63 NR1H2 (0.31)
SCHEMBL6061304 0.63
SCHEMBL5465892 0.63 NR1H2 (0.31)
SCHEMBL202812 0.63 NR1H2 (0.31)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2025226985-A1 PASSIVATION OF POLYSILICON MATERIAL AND SELECTIVE DEPOSITION OF DIELECTRIC MATERIAL UTILIZING ALKYNES VERSUM MATERIALS US, LLC (US) 2025-10-30 WO claimed
WO-2025076009-A1 SELECTIVE DEPOSITION OF SILICON CONTAINING FILMS UTILIZING ORGANOAMINOPOLYSILOXANES AND ORGANOAMINOPOLYSILAZANES VERSUM MATERIALS US, LLC (US) 2025-04-10 WO claimed
US-20230183272-A1 COMPOSITIONS AND METHODS USING SAME FOR SILICON CONTAINING FILMS VERSUM MAT US LLC (US) 2023-06-15 US claimed
CN-113518834-A Compositions for silicon-containing films and methods of use thereof 弗萨姆材料美国有限责任公司 2021-10-19 CN claimed
US-20200247830-A1 Compositions And Methods Using Same for Silicon Containing Films VERSUM MATERIALS US, LLC (US) 2020-08-06 US claimed
US-20260130139-A1 LOW TEMPERATURE SI-CONTAINING FILMS DEPOSITED FROM CHLOROSILANE AND AMINOSILANE REACTIONS VERSUM MAT US LLC (US) 2026-05-07 US disclosed
WO-2025226985-A1 PASSIVATION OF POLYSILICON MATERIAL AND SELECTIVE DEPOSITION OF DIELECTRIC MATERIAL UTILIZING ALKYNES VERSUM MATERIALS US, LLC (US) 2025-10-30 WO disclosed
WO-2025080587-A2 SILICON-CONTAINING FILMS HAVING SURFACES MODIFIED FROM HALOGENATED SILICON-CONTAINING COMPOUNDS VERSUM MATERIALS US, LLC (US) 2025-04-17 WO disclosed
WO-2025076009-A1 SELECTIVE DEPOSITION OF SILICON CONTAINING FILMS UTILIZING ORGANOAMINOPOLYSILOXANES AND ORGANOAMINOPOLYSILAZANES VERSUM MATERIALS US, LLC (US) 2025-04-10 WO disclosed
WO-2024081357-A1 LOW TEMPERATURE SI-CONTAINING FILMS DEPOSITED FROM CHLOROSILANE AND AMINOSILANE REACTIONS VERSUM MATERIALS US, LLC (US) 2024-04-18 WO disclosed
US-20230183272-A1 COMPOSITIONS AND METHODS USING SAME FOR SILICON CONTAINING FILMS VERSUM MAT US LLC (US) 2023-06-15 US disclosed
US-20230183272-A1 COMPOSITIONS AND METHODS USING SAME FOR SILICON CONTAINING FILMS VERSUM MAT US LLC (US) 2023-06-15 US disclosed
CN-113518834-A Compositions for silicon-containing films and methods of use thereof 弗萨姆材料美国有限责任公司 2021-10-19 CN disclosed
US-20200247830-A1 Compositions And Methods Using Same for Silicon Containing Films VERSUM MATERIALS US, LLC (US) 2020-08-06 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20200247830-A1 Compositions And Methods Using Same for Silicon Containing Films SGMS1, SGMS2, SPTBN1 ADH1A 3408/4885ADH1C 3343/4885PHGDH 1925/4885
US-20230183272-A1 COMPOSITIONS AND METHODS USING SAME FOR SILICON CONTAINING FILMS SGMS1, SGMS2, SPTBN1 ADH1A 3408/4885ADH1C 3343/4885PHGDH 1925/4885
US-20260130139-A1 LOW TEMPERATURE SI-CONTAINING FILMS DEPOSITED FROM CHLOROSILANE AND AMINOSILANE REACTIONS AS3MT, SIK1, ADH1A ADH1A 3/4885ADH1C 17/4885PHGDH 1183/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.