SCHEMBL22326130

SCHEMBL22326130

Nc1cc(C(c2ccc(O)c(N)c2)C(F)(F)F)ccc1O

nearest known ligand 0.59

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 8/20 0.59
GAA P10253 7/20 0.59
ALOX12 P18054 3/20 0.59
HTT P42858 2/20 0.59
HIF1A Q16665 1/20 0.59
HSD17B10 Q99714 5/20 0.52
ALOX15 P16050 5/20 0.52
HPGD P15428 5/20 0.52
PKM P14618 2/20 0.52
USP2 O75604 2/20 0.52
ESR1 P03372 1/20 0.50
ESR2 Q92731 1/20 0.50
MAPT P10636 6/20 0.44
MEN1 O00255 4/20 0.44
KMT2A Q03164 4/20 0.44
RECQL P46063 4/20 0.44
SMN1; SMN2 Q16637 2/20 0.43
MAPK1 P28482 2/20 0.43
KDM4E B2RXH2 3/20 0.39
LMNA P02545 2/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30428859 1.00 ALDH1A1 (0.59) ALDH1A1GAAALOX12HTTHIF1A
SCHEMBL30536052 1.00 ALDH1A1 (0.59) ALDH1A1GAAALOX12HTTHIF1A
SCHEMBL24191011 0.89 ALDH1A1 (0.53) ALDH1A1GAAALOX12HTTHIF1A
SCHEMBL5190865 0.86 ALDH1A1 (0.57) ALDH1A1GAAALOX12HTTHIF1A
SCHEMBL23940638 0.85 ALDH1A1 (0.45) ALDH1A1GAAALOX12HTTHIF1A
SCHEMBL23005780 0.83 ESR1 (0.50) ALDH1A1GAAALOX12HTTHIF1A
SCHEMBL24191012 0.83 ALDH1A1 (0.49) ALDH1A1GAAALOX12HTTHIF1A
SCHEMBL13766036 0.78 ALDH1A1 (0.69) ALDH1A1GAAALOX12HTTHIF1A
SCHEMBL25626774 0.78 ALDH1A1 (0.41) ALDH1A1GAAALOX12HTTHIF1A
SCHEMBL1243946 0.77 ALDH1A1 (0.52) ALDH1A1GAAALOX12HTTHIF1A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20220106444-A1 Method for Producing 1,1,1-Trifluoro-2,2-Bisarylethane, and 1,1,1-Trifluoro-2,2-Bisarylethane CENTRAL GLASS COMPANY, LIMITED (JP) 2022-04-07 US claimed
WO-2020162408-A1 METHOD FOR PRODUCING 1,1,1-TRIFLUORO-2,2-BISARYLETHANE, AND 1,1,1-TRIFLUORO-2,2-BISARYLETHANE セントラル硝子株式会社 2020-08-13 WO claimed
US-12435185-B2 Method for producing 1,1,1-trifluoro-2,2-bisarylethane, and 1,1,1-trifluoro-2,2-bisarylethane CENTRAL GLASS COMPANY, LIMITED (JP) 2025-10-07 US disclosed
WO-2025063188-A1 PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, ORGANIC EL DISPLAY DEVICE, AND METHOD FOR PRODUCING CURED PRODUCT 東レ株式会社 2025-03-27 WO disclosed
WO-2025047132-A1 RESIN COMPOSITION, CURED FILM, ELECTRONIC COMPONENT, AND ORGANIC EL DISPLAY DEVICE 東レ株式会社 2025-03-06 WO disclosed
WO-2024171805-A1 POLYIMIDE RESIN, PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, ORGANIC EL DISPLAY DEVICE, AND ELECTRONIC COMPONENT 東レ株式会社 2024-08-22 WO disclosed
WO-2024111466-A1 PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, ORGANIC EL DISPLAY DEVICE, ELECTRONIC COMPONENT, AND SEMICONDUCTOR DEVICE 東レ株式会社 2024-05-30 WO disclosed
US-20230303480-A1 Polybenzoxazole, Polyamide, Polyamide Solution, Insulating Material for High-Frequency Electronic Component, High-Frequency Electronic Component, High-Frequency Equipment, Insulating Material for Producing High-Frequency Electronic Component, Method for Producing Polyamide, Method for Producing Polybenzoxazole, Method for Producing Insulating Material for High-Frequency Electronic Component, and Diamine or Salt Thereof CENTRAL GLASS COMPANY, LIMITED (JP) 2023-09-28 US disclosed
US-20230303480-A1 Polybenzoxazole, Polyamide, Polyamide Solution, Insulating Material for High-Frequency Electronic Component, High-Frequency Electronic Component, High-Frequency Equipment, Insulating Material for Producing High-Frequency Electronic Component, Method for Producing Polyamide, Method for Producing Polybenzoxazole, Method for Producing Insulating Material for High-Frequency Electronic Component, and Diamine or Salt Thereof CENTRAL GLASS COMPANY, LIMITED (JP) 2023-09-28 US disclosed
EP-4194482-A1 POLYBENZOXAZOLE, POLYAMIDE, POLYAMIDE SOLUTION, INSULATION FOR HIGH-FREQUENCY ELECTRONIC COMPONENT, HIGH-FREQUENCY ELECTRONIC COMPONENT, HIGH-FREQUENCY EQUIPMENT, INSULATION MATERIAL FOR PRODUCING HIGH-FREQUENCY ELECTRONIC COMPONENT, METHOD FOR PRODUCING POLYAMIDE, METHOD FOR PRODUCING POLYBENZOXAZOLE, METHOD FOR PRODUCING INSULATION FOR HIGH-FREQUENCY ELECTRONIC COMPONENT, AND DIAMINE OR SALT THEREOF Central Glass Company, Limited (JP) 2023-06-14 EP disclosed
EP-4194482-A1 POLYBENZOXAZOLE, POLYAMIDE, POLYAMIDE SOLUTION, INSULATION FOR HIGH-FREQUENCY ELECTRONIC COMPONENT, HIGH-FREQUENCY ELECTRONIC COMPONENT, HIGH-FREQUENCY EQUIPMENT, INSULATION MATERIAL FOR PRODUCING HIGH-FREQUENCY ELECTRONIC COMPONENT, METHOD FOR PRODUCING POLYAMIDE, METHOD FOR PRODUCING POLYBENZOXAZOLE, METHOD FOR PRODUCING INSULATION FOR HIGH-FREQUENCY ELECTRONIC COMPONENT, AND DIAMINE OR SALT THEREOF Central Glass Company, Limited (JP) 2023-06-14 EP disclosed
US-20220106444-A1 Method for Producing 1,1,1-Trifluoro-2,2-Bisarylethane, and 1,1,1-Trifluoro-2,2-Bisarylethane CENTRAL GLASS COMPANY, LIMITED (JP) 2022-04-07 US disclosed
WO-2022009782-A1 POLYBENZOXAZOLE, POLYAMIDE, POLYAMIDE SOLUTION, INSULATION FOR HIGH-FREQUENCY ELECTRONIC COMPONENT, HIGH-FREQUENCY ELECTRONIC COMPONENT, HIGH-FREQUENCY EQUIPMENT, INSULATION MATERIAL FOR PRODUCING HIGH-FREQUENCY ELECTRONIC COMPONENT, METHOD FOR PRODUCING POLYAMIDE, METHOD FOR PRODUCING POLYBENZOXAZOLE, METHOD FOR PRODUCING INSULATION FOR HIGH-FREQUENCY ELECTRONIC COMPONENT, AND DIAMINE OR SALT THEREOF セントラル硝子株式会社 2022-01-13 WO disclosed
WO-2021028960-A1 COLORED RESIN COMPOSITION, CURED PRODUCT, AND LAMINATE 太陽ホールディングス株式会社 2021-02-18 WO disclosed
WO-2021029243-A1 COLORED RESIN COMPOSITION, CURED PRODUCT AND LAMINATE 太陽ホールディングス株式会社 2021-02-18 WO disclosed
WO-2020162408-A1 METHOD FOR PRODUCING 1,1,1-TRIFLUORO-2,2-BISARYLETHANE, AND 1,1,1-TRIFLUORO-2,2-BISARYLETHANE セントラル硝子株式会社 2020-08-13 WO disclosed
WO-2020162408-A1 METHOD FOR PRODUCING 1,1,1-TRIFLUORO-2,2-BISARYLETHANE, AND 1,1,1-TRIFLUORO-2,2-BISARYLETHANE セントラル硝子株式会社 2020-08-13 WO disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20220106444-A1 Method for Producing 1,1,1-Trifluoro-2,2-Bisarylethane, and 1,1,1-Trifluoro-2,2-Bisarylethane NAF1, FXR1, AFF1 ALDH1A1 624/4885GAA 2670/4885ALOX12 2501/4885
US-20230303480-A1 Polybenzoxazole, Polyamide, Polyamide Solution, Insulating Material for High-Frequency Electronic Component, High-Frequency Electronic Component, High-Frequency Equipment, Insulating Material for Producing High-Frequency Electronic Component, Method for Producing Polyamide, Method for Producing Polybenzoxazole, Method for Producing Insulating Material for High-Frequency Electronic Component, and Diamine or Salt Thereof PUF60, TET1, PBRM1 ALDH1A1 2031/4885GAA 3741/4885ALOX12 4030/4885
US-12435185-B2 Method for producing 1,1,1-trifluoro-2,2-bisarylethane, and 1,1,1-trifluoro-2,2-bisarylethane NAF1, FXR1, AFF1 ALDH1A1 624/4885GAA 2670/4885ALOX12 2501/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.