SCHEMBL2234565

SCHEMBL2234565

C=C(C)C(=O)OC(C)(CC)OC(=O)C(=C)C

nearest known ligand 0.42

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.42
THRB P10828 1/20 0.41
TSHR P16473 4/20 0.39
GAA P10253 1/20 0.32
TDP1 Q9NUW8 1/20 0.31
GLO1 Q04760 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27686490 0.89 ALDH1A1 (0.34) ALDH1A1THRBTSHR
SCHEMBL15841862 0.89 THRB (0.37) ALDH1A1THRBTSHR
SCHEMBL29059847 0.88 THRB (0.40) ALDH1A1THRBTSHR
SCHEMBL2018530 0.85 ALDH1A1 (0.34) ALDH1A1THRBTSHR
SCHEMBL15813673 0.83 ALDH1A1 (0.33) ALDH1A1THRBTSHR
SCHEMBL347723 0.82 ALDH1A1 (0.42) ALDH1A1THRBTSHRGAATDP1
SCHEMBL1108024 0.82 TSHR (0.43) ALDH1A1THRBTSHRGAATDP1
Ammonia Solution, Strong SCHEMBL7724540 0.80 TSHR (0.42) ALDH1A1THRBTSHRGAA
SCHEMBL782309 0.80 ALDH1A1 (0.41) ALDH1A1THRBTSHRGAA
SCHEMBL865488 0.80 ALDH1A1 (0.41) ALDH1A1THRBTSHRGAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7981948-B2 Artificial stone and associated methods CHEIL INDUSTRIES, INC. (KR) 2011-07-19 US claimed
US-20090203818-A1 Artificial stone and associated methods LOTTE ADVANCED MATERIALS CO., LTD. (KR) 2009-08-13 US claimed
US-7981948-B2 Artificial stone and associated methods CHEIL INDUSTRIES, INC. (KR) 2011-07-19 US disclosed
US-20090203818-A1 Artificial stone and associated methods LOTTE ADVANCED MATERIALS CO., LTD. (KR) 2009-08-13 US disclosed
CN-1265678-A High internal phase emulsions and porous materials prepared therefrom DOW CHEMICAL CO (US) 2000-09-06 CN disclosed
CN-85107537-A Embed the method for Circuits System and electronic circuit system 1987-04-15 CN disclosed