⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8034267 | 0.93 | — | — | |
| SCHEMBL5393817 | 0.89 | DNM1 (0.41) | — | |
| SCHEMBL5383782 | 0.84 | — | — | |
| SCHEMBL4392722 | 0.79 | — | — | |
| SCHEMBL9685081 | 0.79 | — | — | |
| SCHEMBL2030789 | 0.78 | NFKB1 (0.30) | — | |
| SCHEMBL8331950 | 0.76 | — | — | |
| SCHEMBL7562867 | 0.76 | — | — | |
| SCHEMBL14506135 | 0.74 | — | — | |
| SCHEMBL5389406 | 0.73 | MAOA (0.39) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 49 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5985374-A | Chemical treatment for silica-containing glass surfaces | LUCENT TECHNOLOGIES INC. (US) | 1999-11-16 | — | — | US | claimed |
| CN-111601840-A | Resin composition for display substrate, resin film for display substrate, laminate comprising same, image display device, organic EL display, and methods for producing same | 东丽株式会社 | 2020-08-28 | — | — | CN | disclosed |
| US-9976055-B2 | Lower temperature cure coating compositions | KING INDUSTRIES (US) | 2018-05-22 | — | — | US | disclosed |
| EP-3114164-A1 | LOWER TEMPERATURE CURE COATING COMPOSITIONS | King Industries, Inc. (US) | 2017-01-11 | — | — | EP | disclosed |
| US-20150368824-A1 | WATER AND OIL ULTRA-REPELLENT STRUCTURE AND MANUFACTURING METHOD THEREFOR | KOOKMIN UNIVERSITY INDUSTRY ACADEMY COOPERATION FOUNDATION (KR) | 2015-12-24 | — | — | US | disclosed |
| WO-2015106174-A1 | LOWER TEMPERATURE CURE COATING COMPOSITIONS | KING INDUSTRIES (US) | 2015-07-16 | — | — | WO | disclosed |
| US-20150197665-A1 | LOWER TEMPERATURE CURE COATING COMPOSITIONS | KING INDUSTRIES (US) | 2015-07-16 | — | — | US | disclosed |
| WO-2014110511-A1 | PROTECTIVE BARRIERS FOR PREVENTING OR REDUCING TRANSFER OF MICROORGANISMS | PRESIDENT AND FELLOWS OF HARVARD COLLEGE (US) | 2014-07-17 | — | — | WO | disclosed |
| US-20130216723-A1 | SULFONATE ESTERS AS LATENT ACID CATALYSTS | KING INDUSTRIES (US) | 2013-08-22 | — | — | US | disclosed |
| US-8431730-B2 | Sulfonate esters as latent acid catalysts | KING INDUSTRIES (US) | 2013-04-30 | — | — | US | disclosed |
| US-5736245-A | Chemical treatment for silica-containing glass surfaces | LUCENT TECHNOLOGIES INC. (US) | 1998-04-07 | — | — | US | disclosed |
| US-5415927-A | Water-repellant glass products and process for the production thereof | NIPPON SHEET GLASS CO., LTD. (JP) | 1995-05-16 | — | — | US | disclosed |
| EP-0647886-A1 | Polyesteramide-siloxane toner and developer compositions | XEROX CORPORATION (US) | 1995-04-12 | — | — | EP | disclosed |
| US-5401601-A | Polyesteramide-siloxane toner and developer compositions | XEROX CORPORATION (US) | 1995-03-28 | — | — | US | disclosed |
| EP-0535691-A1 | Water-repellent products and process for the production thereof | NIPPON SHEET GLASS CO., LTD. (JP) | 1993-04-07 | — | — | EP | disclosed |
| US-4933414-A | Radiation active silicon compounds having amide limited mercaptan functional groups | GENERAL ELECTRIC COMPANY (US) | 1990-06-12 | — | — | US | disclosed |
| US-4816496-A | HEAT AND LIGHT RESISTANT ADHESIVES AND FILMS | KABUSHIKI KAISHA TOSHIBA (JP) | 1989-03-28 | — | — | US | disclosed |
| US-4783490-A | Radiation active silicon compounds having amide limited mercaptan functional groups | GENERAL ELECTRIC COMPANY (US) | 1988-11-08 | — | — | US | disclosed |
| EP-0282634-A1 | Photocurable composition | KABUSHIKI KAISHA TOSHIBA (JP) | 1988-09-21 | — | — | EP | disclosed |
| EP-0172330-A1 | Photocurable composition | KABUSHIKI KAISHA TOSHIBA (JP) | 1986-02-26 | — | — | EP | disclosed |