SCHEMBL22374191

SCHEMBL22374191

CC(C)(OC(=O)c1ccc(Oc2ccccc2)cc1)C1CCNCC1

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CHRNB2 P17787 1/20 0.42
CHRNB4 P30926 1/20 0.42
CHRNA3 P32297 1/20 0.42
CHRNA7 P36544 1/20 0.42
CHRNA4 P43681 1/20 0.42
PARP10 Q53GL7 1/20 0.41
SMN1; SMN2 Q16637 1/20 0.41
MEN1 O00255 3/20 0.40
KMT2A Q03164 3/20 0.40
ALDH1A1 P00352 3/20 0.40
LMNA P02545 2/20 0.40
SRD5A2 P31213 1/20 0.40
NPC1 O15118 1/20 0.40
RAB9A P51151 1/20 0.40
L3MBTL1 Q9Y468 1/20 0.40
EZH2 Q15910 1/20 0.40
PPARA Q07869 1/20 0.39
CYP2D6 P10635 1/20 0.39
HRH1 P35367 1/20 0.39
SCN1A P35498 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22373159 0.89 MGLL (0.40) CHRNB4CHRNA3PARP10NPC1RAB9A
SCHEMBL22372789 0.89 TSHR (0.46) CHRNA7MEN1KMT2AALDH1A1LMNA
SCHEMBL22374189 0.89 NPC1 (0.47) PARP10SMN1; SMN2MEN1KMT2ANPC1
SCHEMBL22373044 0.88 MEN1 (0.41) SMN1; SMN2MEN1KMT2AALDH1A1LMNA
SCHEMBL22372855 0.87 SCN1A (0.45) SMN1; SMN2MEN1KMT2AALDH1A1LMNA
SCHEMBL22372854 0.87 ALDH1A1 (0.43) MEN1KMT2AALDH1A1LMNANPC1
SCHEMBL22373370 0.85 ELANE (0.50) CHRNB2CHRNB4CHRNA3CHRNA7CHRNA4
SCHEMBL22372811 0.82 MEN1 (0.38) SMN1; SMN2MEN1KMT2AALDH1A1LMNA
SCHEMBL22373194 0.82 CA12 (0.42) SMN1; SMN2MEN1KMT2AALDH1A1LMNA
SCHEMBL22373124 0.82 KMT2A (0.51) SMN1; SMN2MEN1KMT2AALDH1A1LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-11415887-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2022-08-16 US disclosed
US-20200272048-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-08-27 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR CHRNB2 2117/4885CHRNB4 1301/4885CHRNA3 1547/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.