SCHEMBL5701976

SCHEMBL5701976

C1=Cc2ccccc21.CO[SiH](OC)OC

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
P2RX4 Q99571 1/20 0.38
MAPT P10636 2/20 0.36
GAA P10253 1/20 0.36
CA4 P22748 2/20 0.35
CA12 O43570 1/20 0.35
CA1 P00915 1/20 0.35
CA2 P00918 1/20 0.35
CA7 P43166 1/20 0.35
CA9 Q16790 1/20 0.35
CA14 Q9ULX7 1/20 0.35
KDM4E B2RXH2 2/20 0.32
ALDH1A1 P00352 2/20 0.32
MAPK1 P28482 1/20 0.32
SMN1; SMN2 Q16637 1/20 0.32
LMNA P02545 2/20 0.32
ACHE P22303 2/20 0.32
TSHR P16473 1/20 0.32
ALOX12 P18054 1/20 0.32
RET P07949 1/20 0.31
MEN1 O00255 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Toluene SCHEMBL2550635 0.78 ACHE (0.61) MAPTCA4CA12CA1CA2
Naphthalene SCHEMBL27806519 0.77 CYP2A6 (0.50) MAPTCA4CA12CA1CA2
Naphthalene SCHEMBL22472004 0.77 CYP2A6 (0.50) MAPTCA4CA12CA1CA2
SCHEMBL29418986 0.74 MAPT (0.53) P2RX4MAPTGAACA4CA12
SCHEMBL33554 0.74
SCHEMBL29398195 0.74
SCHEMBL3767165 0.74 MAPT (0.53) P2RX4MAPTGAACA4CA12
SCHEMBL29375766 0.74 MAPT (0.53) P2RX4MAPTGAACA4CA12
SCHEMBL27566643 0.74 MAPT (0.53) P2RX4MAPTGAACA4CA12
Biphenyl SCHEMBL1048244 0.74 ALDH1A1 (0.53) MAPTCA4ALDH1A1MAPK1SMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117148676-A Negative photoresist composition for organic insulating film of liquid crystal display element 烟台希尔德材料科技有限公司 2023-12-01 CN disclosed
US-20160299376-A1 LIQUID CRYSTAL DISPLAY DEVICE, RADIATION-SENSITIVE RESIN COMPOSITION, INTERLAYER INSULATING FILM, METHOD FOR PRODUCING INTERLAYER INSULATING FILM, AND METHOD FOR MANUFACTURING LIQUID CRYSTAL DISPLAY DEVICE JSR CORPORATION (JP) 2016-10-13 US disclosed
US-20140014928-A1 ORGANIC EL ELEMENT, RADIATION-SENSITIVE RESIN COMPOSITION, AND CURED FILM JSR CORPORATION (JP) 2014-01-16 US disclosed
EP-1510520-B1 Preparation of branched siloxane SHINETSU CHEMICAL CO (JP) 2006-07-26 EP disclosed
US-6943264-B2 Preparation of branched siloxane SHIN-ETSU CHEMICAL, CO., LTD. (JP) 2005-09-13 US disclosed
US-20050049427-A1 Preparation of branched siloxane SHIN-ETSU CHEMICAL CO., LTD. (JP) 2005-03-03 US disclosed
EP-1510520-A1 Preparation of branched siloxane Shin-Etsu Chemical Co., Ltd. (JP) 2005-03-02 EP disclosed