SCHEMBL22484791

SCHEMBL22484791

c1ccc2cc3c(cc2c1)Nc1cc2ccccc2cc1O3

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALOX5 P09917 6/20 0.52
MAPT P10636 3/20 0.45
NPSR1 Q6W5P4 2/20 0.45
MAPK1 P28482 2/20 0.45
GAA P10253 2/20 0.45
NPC1 O15118 1/20 0.45
RAB9A P51151 1/20 0.45
NOX1 Q9Y5S8 1/20 0.45
POLB P06746 2/20 0.36
CASP6 P55212 1/20 0.36
SMN1; SMN2 Q16637 1/20 0.36
HTR2B P41595 2/20 0.35
HTR7 P34969 1/20 0.35
KDM4E B2RXH2 2/20 0.34
ATM Q13315 1/20 0.34
MEN1 O00255 2/20 0.33
KMT2A Q03164 2/20 0.33
GRIN2D O15399 1/20 0.33
GRIN3B O60391 1/20 0.33
GRIN1 Q05586 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30779382 0.92 ALOX5 (0.68) ALOX5MAPTNPSR1MAPK1GAA
SCHEMBL302837 0.92 ALOX5 (0.68) ALOX5MAPTNPSR1MAPK1GAA
Bicarbonate SCHEMBL6265696 0.84 ALOX5 (0.62) ALOX5MAPTNPSR1MAPK1GAA
Phenoxazine SCHEMBL6846406 0.79 ALOX5 (0.77) ALOX5MAPTNPSR1MAPK1GAA
SCHEMBL30076196 0.79 MAPT (0.56) ALOX5MAPTNPSR1MAPK1GAA
SCHEMBL903605 0.79 AHR (0.46) ALOX5MAPTNPSR1MAPK1POLB
SCHEMBL16779994 0.79 AHR (0.46) ALOX5MAPTNPSR1MAPK1POLB
SCHEMBL9921312 0.79 MAPT (0.56) ALOX5MAPTNPSR1MAPK1GAA
SCHEMBL18903054 0.78 NPC1 (0.38) ALOX5MAPTNPSR1MAPK1GAA
SCHEMBL24141298 0.77 ALOX5 (0.53) ALOX5MAPTNPSR1GAAHTR2B

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11782347-B2 Composition for forming organic film, patterning process, and polymer SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-10-10 US disclosed
US-11782347-B2 Composition for forming organic film, patterning process, and polymer SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-10-10 US disclosed
US-11709429-B2 Composition for forming organic film, patterning process, and polymer SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-07-25 US disclosed
US-11709429-B2 Composition for forming organic film, patterning process, and polymer SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-07-25 US disclosed
US-11675268-B2 Composition for forming organic film, patterning process, and polymer SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-06-13 US disclosed
US-20210278766-A1 COATING-TYPE COMPOSITION FOR FORMING ORGANIC FILM, PATTERNING PROCESS, POLYMER, AND METHOD FOR MANUFACTURING POLYMER SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-09-09 US disclosed
WO-2021135035-A1 HIGH-PERFORMANCE SKY-BLUE THERMALLY ACTIVATED DELAYED FLUORESCENT MATERIAL, AND PREPARATION METHOD THEREFOR AND APPLICATION THEREOF 武汉华星光电半导体显示技术有限公司 2021-07-08 WO disclosed
US-20210011384-A1 COMPOSITION FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND POLYMER SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-01-14 US disclosed
US-20210003920-A1 COMPOSITION FOR FORMING ORGANIC FILM, SUBSTRATE FOR MANUFACTURING SEMICONDUCTOR DEVICE, METHOD FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND POLYMER SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-01-07 US disclosed
US-20200387071-A1 COMPOSITION FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND POLYMER SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-12-10 US disclosed
WO-2020191866-A1 THERMALLY ACTIVATED DELAYED FLUORESCENT MATERIAL AND PREPARATION METHOD THEREFOR, AND ORGANIC LIGHT EMITTING DEVICE 武汉华星光电半导体显示技术有限公司 2020-10-01 WO disclosed