SCHEMBL22503060

SCHEMBL22503060

CC(=O)OCC(=O)NS(=O)(=O)C(F)(F)F

nearest known ligand 0.39

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
▸ FAAH O00519 1/20 0.39
▸ ALDH1A1 P00352 3/20 0.37
▸ SMN1; SMN2 Q16637 6/20 0.36
▸ CA1 P00915 1/20 0.35
▸ CA2 P00918 1/20 0.35
▸ MMP2 P08253 2/20 0.34
▸ MMP9 P14780 2/20 0.34
▸ MMP12 P39900 2/20 0.34
▸ MAPK1 P28482 1/20 0.34
▸ HPGD P15428 2/20 0.33
▸ HSD17B10 Q99714 2/20 0.33
▸ USP2 O75604 1/20 0.33
▸ NPC1 O15118 1/20 0.33
▸ MAPT P10636 1/20 0.33
▸ RAB9A P51151 1/20 0.33
▸ PKM P14618 1/20 0.33
▸ LMNA P02545 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10076880 0.74 CA1 (0.42) ALDH1A1SMN1; SMN2CA1CA2MMP2
SCHEMBL22503058 0.73 ALDH1A1 (0.48) ALDH1A1HPGDMAPTLMNA
SCHEMBL13271935 0.72 MAPK1 (0.39) SMN1; SMN2CA1CA2MMP2MMP9
SCHEMBL27552476 0.71 CA1 (0.44) SMN1; SMN2CA1CA2MMP2MMP9
SCHEMBL24499475 0.71 TSHR (0.30) —
SCHEMBL7240710 0.71 HDAC3 (0.43) FAAHALDH1A1SMN1; SMN2CA1CA2
SCHEMBL18969615 0.71 CA1 (0.44) SMN1; SMN2CA1CA2MMP2MMP9
SCHEMBL1618240 0.71 CA2 (0.48) SMN1; SMN2CA1CA2MMP2MMP9
SCHEMBL24361340 0.71 LMNA (0.45) ALDH1A1SMN1; SMN2MAPK1HPGDNPC1
SCHEMBL2742129 0.71 ALDH1A1 (0.57) ALDH1A1SMN1; SMN2MAPK1MAPTLMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230161252-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-25 — — US disclosed
US-20230161252-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-25 — — US disclosed
US-10792489-B2 Bio-electrode composition, bio-electrode, and method for manufacturing the bio-electrode SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-10-06 — — US disclosed
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