SCHEMBL22503082

SCHEMBL22503082

CC(C)c1cc(C(=O)NS(=O)(=O)C(F)(F)F)cc(C(C)C)c1

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ SCN5A Q14524 1/20 0.39
▸ SCN9A Q15858 1/20 0.39
▸ CCR2 P41597 1/20 0.36
▸ VCP P55072 1/20 0.36
▸ KAT6A Q92794 3/20 0.36
▸ GAA P10253 1/20 0.35
▸ CA1 P00915 1/20 0.35
▸ CA2 P00918 1/20 0.35
▸ FABP3 P05413 2/20 0.35
▸ FABP4 P15090 2/20 0.35
▸ FABP5 Q01469 1/20 0.35
▸ HTR7 P34969 1/20 0.35
▸ MAPK1 P28482 1/20 0.34
▸ SMN1; SMN2 Q16637 1/20 0.34
▸ CXCR2 P25025 1/20 0.34
▸ KDM4E B2RXH2 1/20 0.33
▸ LMNA P02545 1/20 0.33
▸ HTT P42858 1/20 0.33
▸ TP53BP1 Q12888 1/20 0.33
▸ PTPN1 P18031 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22503319 0.84 LMNA (0.49) SCN5ASCN9AVCPSMN1; SMN2KDM4E
SCHEMBL22503300 0.81 FABP3 (0.49) SCN5ASCN9ACCR2GAAFABP3
SCHEMBL22503208 0.76 CES2 (0.43) SCN5ASCN9AVCPCA1CA2
SCHEMBL22503087 0.75 HDAC6 (0.48) SCN5ASCN9AGAACA1CA2
SCHEMBL22789926 0.75 SCN5A (0.40) SCN5ASCN9ACCR2VCPCA1
SCHEMBL22503330 0.75 FLT1 (0.54) SCN5ASCN9ACCR2GAACA1
SCHEMBL22503185 0.75 CES2 (0.45) SCN5ASCN9ACCR2VCPCA1
SCHEMBL26163074 0.75 NOTUM (0.39) SCN5ASCN9AVCPCA1CA2
SCHEMBL20364782 0.73 HDAC8 (0.45) SCN5ASCN9AVCPSMN1; SMN2LMNA
SCHEMBL22503309 0.71 HDAC1 (0.55) SCN5ASCN9AVCPGAACA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230161252-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-25 — — US disclosed
US-20230161252-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-25 — — US disclosed
US-10792489-B2 Bio-electrode composition, bio-electrode, and method for manufacturing the bio-electrode SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-10-06 — — US disclosed
Send feedback