SCHEMBL22503330

SCHEMBL22503330

O=C(NS(=O)(=O)C(F)(F)F)c1cc(Cl)cc(Cl)c1

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ FLT1 P17948 3/20 0.54
▸ FLT4 P35916 3/20 0.54
▸ KDR P35968 3/20 0.54
▸ MEN1 O00255 1/20 0.41
▸ PLA2G1B P04054 1/20 0.41
▸ CYP1A2 P05177 1/20 0.41
▸ CYP3A4 P08684 1/20 0.41
▸ GAA P10253 1/20 0.41
▸ CYP2D6 P10635 1/20 0.41
▸ CYP2C19 P33261 1/20 0.41
▸ KMT2A Q03164 1/20 0.41
▸ TDP1 Q9NUW8 1/20 0.41
▸ ATG4B Q9Y4P1 1/20 0.41
▸ RAB9A P51151 1/20 0.41
▸ TPMT P51580 1/20 0.41
▸ FABP4 P15090 1/20 0.39
▸ SCN5A Q14524 1/20 0.39
▸ SCN9A Q15858 1/20 0.39
▸ CA1 P00915 1/20 0.39
▸ CA2 P00918 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26163076 0.83 FLT1 (0.60) FLT1FLT4KDRRAB9ACA1
SCHEMBL22503116 0.82 FLT1 (0.59) FLT1FLT4KDRMEN1CYP1A2
SCHEMBL22503208 0.80 CES2 (0.43) RAB9ASCN5ASCN9ACA1CA2
SCHEMBL26163074 0.79 NOTUM (0.39) FLT1FLT4KDRSCN5ASCN9A
SCHEMBL22503185 0.79 CES2 (0.45) FLT1FLT4KDRSCN5ASCN9A
SCHEMBL22789926 0.76 SCN5A (0.40) MEN1CYP2C19KMT2ASCN5ASCN9A
SCHEMBL22503087 0.76 HDAC6 (0.48) MEN1CYP3A4GAAKMT2ATDP1
SCHEMBL22503305 0.76 CES2 (0.48) SCN5ASCN9A
SCHEMBL22503082 0.75 SCN5A (0.39) GAAFABP4SCN5ASCN9ACA1
SCHEMBL178335 0.74 HDAC3 (0.52) FLT1FLT4KDRMEN1GAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230161252-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-25 — — US disclosed
US-20230161252-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-25 — — US disclosed
US-10792489-B2 Bio-electrode composition, bio-electrode, and method for manufacturing the bio-electrode SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-10-06 — — US disclosed
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