SCHEMBL22503133

SCHEMBL22503133

O=C(NS(=O)(=O)C(F)(F)F)c1ccoc1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KCNK3 O14649 1/20 0.41
KCNK9 Q9NPC2 1/20 0.41
RAB9A P51151 1/20 0.38
SCN5A Q14524 1/20 0.38
SCN9A Q15858 1/20 0.38
MAPT P10636 2/20 0.37
PTK2 Q05397 1/20 0.37
PTPN1 P18031 1/20 0.36
PTPN6 P29350 1/20 0.36
PTPN11 Q06124 1/20 0.36
CA1 P00915 1/20 0.36
CA2 P00918 1/20 0.36
ITGAV P06756 3/20 0.36
ITGA2 P17301 1/20 0.36
ADORA1 P30542 2/20 0.35
TMIGD3 P0DMS9 1/20 0.35
MAPK1 P28482 1/20 0.35
SMN1; SMN2 Q16637 1/20 0.35
TRPA1 O75762 1/20 0.35
VCP P55072 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL892680 0.75 KCNK3 (0.45) KCNK3KCNK9RAB9AMAPTPTK2
SCHEMBL178335 0.75 HDAC3 (0.52) RAB9ASCN5ASCN9AMAPTPTPN1
SCHEMBL7046046 0.74
SCHEMBL22503128 0.74 PTGS2 (0.49) SCN5ASCN9APTPN1CA1CA2
SCHEMBL22503140 0.74 MPO (0.47) RAB9ASCN5ASCN9AMAPTCA1
SCHEMBL22503135 0.74 SCN5A (0.57) RAB9ASCN5ASCN9AMAPTPTPN1
SCHEMBL22503102 0.73 SCN5A (0.45) SCN5ASCN9APTPN1PTPN11CA1
SCHEMBL22503116 0.72 FLT1 (0.59) RAB9ASCN5ASCN9AMAPT
SCHEMBL22503309 0.72 HDAC1 (0.55) RAB9ASCN5ASCN9AMAPTCA1
SCHEMBL22503119 0.72 TRPV1 (0.50) SCN5ASCN9APTPN1CA1CA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230161252-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-25 US disclosed
US-20230161252-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-25 US disclosed
US-10792489-B2 Bio-electrode composition, bio-electrode, and method for manufacturing the bio-electrode SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-10-06 US disclosed