SCHEMBL22503102

SCHEMBL22503102

C[Si](C)(C)c1ccc(C(=O)NS(=O)(=O)C(F)(F)F)cc1

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SCN5A Q14524 1/20 0.45
SCN9A Q15858 1/20 0.45
VCP P55072 1/20 0.44
NR1H2 P55055 1/20 0.41
NR1H3 Q13133 1/20 0.41
PTPN1 P18031 1/20 0.39
MAPK1 P28482 1/20 0.38
SMN1; SMN2 Q16637 1/20 0.38
ACHE P22303 1/20 0.38
HTR7 P34969 1/20 0.38
HDAC1 Q13547 1/20 0.37
FLT1 P17948 1/20 0.37
FLT4 P35916 1/20 0.37
KDR P35968 1/20 0.37
PTPN11 Q06124 1/20 0.37
CA1 P00915 1/20 0.36
CA2 P00918 1/20 0.36
PIN1 Q13526 1/20 0.36
PTGFR P43088 1/20 0.36
PPARA Q07869 2/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22503309 0.83 HDAC1 (0.55) SCN5ASCN9AVCPSMN1; SMN2HDAC1
SCHEMBL22503299 0.81 HDAC1 (0.59) SCN5ASCN9AHDAC1CA1CA2
SCHEMBL22503128 0.81 PTGS2 (0.49) SCN5ASCN9APTPN1HTR7CA1
SCHEMBL22503135 0.81 SCN5A (0.57) SCN5ASCN9APTPN1
SCHEMBL22503140 0.81 MPO (0.47) SCN5ASCN9AVCPFLT1FLT4
SCHEMBL22503064 0.80 SCN9A (0.45) SCN5ASCN9AVCPPTPN1MAPK1
SCHEMBL22503119 0.79 TRPV1 (0.50) SCN5ASCN9AVCPPTPN1HTR7
SCHEMBL22503271 0.79 PTGS1 (0.50) SCN5ASCN9AVCPSMN1; SMN2CA1
SCHEMBL22503116 0.79 FLT1 (0.59) SCN5ASCN9AFLT1FLT4KDR
SCHEMBL26163078 0.79 OGG1 (0.48) SCN5ASCN9ASMN1; SMN2HDAC1CA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230161252-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-25 US disclosed
US-20230161252-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-25 US disclosed
US-10792489-B2 Bio-electrode composition, bio-electrode, and method for manufacturing the bio-electrode SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-10-06 US disclosed