SCHEMBL22503153

SCHEMBL22503153

C/C=C/C=C/C(=O)NS(=O)(=O)C(F)(F)F

nearest known ligand 0.37

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
CNR2 P34972 8/20 0.37
CNR1 P21554 6/20 0.37
RAB9A P51151 1/20 0.37
PPARG P37231 1/20 0.36
PPARD Q03181 1/20 0.36
PPARA Q07869 1/20 0.36
CA1 P00915 1/20 0.35
CA2 P00918 1/20 0.35
TRPA1 O75762 1/20 0.31
TRPV1 Q8NER1 1/20 0.31
MAPK1 P28482 1/20 0.31
SMN1; SMN2 Q16637 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22503244 0.80 CA1 (0.34) CA1CA2
SCHEMBL22503200 0.75 CA1 (0.39) CA1CA2SMN1; SMN2
SCHEMBL4602455 0.70 CA1 (0.42) CA1CA2MAPK1SMN1; SMN2
SCHEMBL22503234 0.69 CA1 (0.34) CA1CA2MAPK1SMN1; SMN2
SCHEMBL22503149 0.67 FAAH (0.46) CNR2CNR1PPARGPPARA
SCHEMBL1618240 0.66 CA2 (0.48) CA1CA2MAPK1SMN1; SMN2
SCHEMBL3438969 0.66
SCHEMBL22881957 0.66
SCHEMBL468021 0.66
SCHEMBL10054192 0.66

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230161252-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-25 US disclosed
US-20230161252-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-25 US disclosed
US-10792489-B2 Bio-electrode composition, bio-electrode, and method for manufacturing the bio-electrode SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-10-06 US disclosed