SCHEMBL22503244

SCHEMBL22503244

C=C/C=C/C=C/C(=O)NS(=O)(=O)C(F)(F)F

nearest known ligand 0.34

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
CA1 P00915 1/20 0.34
CA2 P00918 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22503153 0.80 CNR2 (0.37) CA1CA2
SCHEMBL4602455 0.77 CA1 (0.42) CA1CA2
SCHEMBL22503234 0.75 CA1 (0.34) CA1CA2
SCHEMBL22503200 0.73 CA1 (0.39) CA1CA2
SCHEMBL28403238 0.66 ALDH1A1 (0.32)
SCHEMBL25708327 0.64 CA2 (0.52) CA1CA2
SCHEMBL10789031 0.64 CA2 (0.52) CA1CA2
SCHEMBL22503224 0.63 ALDH1A1 (0.43) CA1CA2
SCHEMBL31602228 0.63 CA1 (0.41) CA1CA2
SCHEMBL19810864 0.62 CA1 (0.50) CA1CA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230161252-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-25 US disclosed
US-20230161252-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-25 US disclosed
US-10792489-B2 Bio-electrode composition, bio-electrode, and method for manufacturing the bio-electrode SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-10-06 US disclosed