SCHEMBL22503200

SCHEMBL22503200

O=C(O)/C=C\C(=O)NS(=O)(=O)C(F)(F)F

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA1 P00915 1/20 0.39
CA2 P00918 1/20 0.39
ALDH1A1 P00352 9/20 0.38
TSHR P16473 2/20 0.38
GAA P10253 2/20 0.38
TP53 P04637 1/20 0.38
EGLN1 Q9GZT9 1/20 0.38
EGLN3 Q9H6Z9 1/20 0.38
KMT2A Q03164 2/20 0.37
POLB P06746 1/20 0.36
HTT P42858 2/20 0.35
L3MBTL1 Q9Y468 2/20 0.35
PKM P14618 1/20 0.35
HPGD P15428 1/20 0.35
LPAR2 Q9HBW0 2/20 0.33
LPAR3 Q9UBY5 1/20 0.33
NPC1 O15118 1/20 0.33
LMNA P02545 1/20 0.33
THRB P10828 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22503234 0.77 CA1 (0.34) CA1CA2SMN1; SMN2
SCHEMBL22503153 0.75 CNR2 (0.37) CA1CA2SMN1; SMN2
SCHEMBL4602455 0.74 CA1 (0.42) CA1CA2ALDH1A1TSHRSMN1; SMN2
SCHEMBL22503244 0.73 CA1 (0.34) CA1CA2
SCHEMBL19810864 0.72 CA1 (0.50) CA1CA2ALDH1A1L3MBTL1SMN1; SMN2
SCHEMBL25708327 0.69 CA2 (0.52) CA1CA2ALDH1A1L3MBTL1SMN1; SMN2
SCHEMBL10789031 0.69 CA2 (0.52) CA1CA2ALDH1A1L3MBTL1SMN1; SMN2
SCHEMBL14855174 0.69 CA1 (0.46) CA1CA2ALDH1A1L3MBTL1SMN1; SMN2
SCHEMBL20838792 0.68 ALDH1A1 (0.43) ALDH1A1TSHRGAATP53EGLN1
SCHEMBL19019137 0.67 CA1 (0.50) CA1CA2ALDH1A1L3MBTL1SMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230161252-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-25 US disclosed
US-20230161252-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-25 US disclosed
US-10792489-B2 Bio-electrode composition, bio-electrode, and method for manufacturing the bio-electrode SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-10-06 US disclosed