SCHEMBL22503181

SCHEMBL22503181

CC(C)(c1ccccc1)c1ccc(C(=O)NS(=O)(=O)C(F)(F)F)cc1

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PTPN11 Q06124 1/20 0.51
VCP P55072 1/20 0.47
NR3C2 P08235 3/20 0.46
SCN5A Q14524 1/20 0.46
SCN9A Q15858 1/20 0.46
LMNA P02545 2/20 0.45
HDAC1 Q13547 3/20 0.43
HDAC3 O15379 2/20 0.43
HDAC4 P56524 2/20 0.43
HDAC7 Q8WUI4 2/20 0.43
HDAC2 Q92769 2/20 0.43
HDAC10 Q969S8 2/20 0.43
HDAC11 Q96DB2 2/20 0.43
HDAC8 Q9BY41 2/20 0.43
HDAC6 Q9UBN7 2/20 0.43
HDAC9 Q9UKV0 2/20 0.43
HDAC5 Q9UQL6 2/20 0.43
ALDH1A1 P00352 1/20 0.43
ESR1 P03372 1/20 0.43
CYP3A4 P08684 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL178335 0.85 HDAC3 (0.52) VCPSCN5ASCN9ALMNAHDAC1
SCHEMBL22503299 0.84 HDAC1 (0.59) SCN5ASCN9ALMNAHDAC1HDAC3
SCHEMBL22503084 0.83 CTDSP1 (0.53) VCPSCN5ASCN9AHDAC1HDAC3
SCHEMBL22503135 0.80 SCN5A (0.57) SCN5ASCN9APTPN1RAB9ANPC1
SCHEMBL22503205 0.80 KMT2A (0.56) VCPLMNAALDH1A1CYP3A4PTPN1
SCHEMBL22503188 0.80 VCP (0.45) VCPSCN5ASCN9ALMNAHDAC1
SCHEMBL22503086 0.79 HDAC1 (0.46) VCPSCN5ASCN9ALMNAHDAC1
SCHEMBL22503309 0.79 HDAC1 (0.55) VCPSCN5ASCN9ALMNAHDAC1
SCHEMBL22503085 0.79 VCP (0.52) VCPLMNAHDAC1HDAC3HDAC4
SCHEMBL22503128 0.77 PTGS2 (0.49) SCN5ASCN9APTPN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230161252-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-25 US disclosed
US-20230161252-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-25 US disclosed
US-10792489-B2 Bio-electrode composition, bio-electrode, and method for manufacturing the bio-electrode SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-10-06 US disclosed