SCHEMBL22503299

SCHEMBL22503299

CC(C)(C)c1ccc(C(=O)NS(=O)(=O)C(F)(F)F)cc1

nearest known ligand 0.59

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
HDAC1 Q13547 1/20 0.59
TRPV1 Q8NER1 3/20 0.53
HDAC3 O15379 5/20 0.50
HDAC8 Q9BY41 5/20 0.50
HDAC6 Q9UBN7 5/20 0.50
HDAC11 Q96DB2 3/20 0.50
EPHX2 P34913 2/20 0.50
SCN5A Q14524 1/20 0.49
SCN9A Q15858 1/20 0.49
POLB P06746 1/20 0.49
CA1 P00915 2/20 0.48
CA2 P00918 2/20 0.48
MEN1 O00255 1/20 0.48
KMT2A Q03164 1/20 0.48
NPSR1 Q6W5P4 1/20 0.48
MAPT P10636 1/20 0.46
NR1H4 Q96RI1 1/20 0.46
LMNA P02545 1/20 0.46
RAB9A P51151 1/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22503135 0.86 SCN5A (0.57) TRPV1SCN5ASCN9AKMT2AMAPT
SCHEMBL22503087 0.85 HDAC6 (0.48) HDAC1TRPV1HDAC3HDAC8HDAC6
SCHEMBL22503309 0.84 HDAC1 (0.55) HDAC1HDAC6SCN5ASCN9APOLB
SCHEMBL22503181 0.84 PTPN11 (0.51) HDAC1HDAC3HDAC8HDAC6HDAC11
SCHEMBL22503128 0.82 PTGS2 (0.49) SCN5ASCN9ACA1CA2MEN1
SCHEMBL22503140 0.82 MPO (0.47) SCN5ASCN9ACA1CA2MEN1
SCHEMBL22503064 0.81 SCN9A (0.45) HDAC1HDAC8HDAC6EPHX2SCN5A
SCHEMBL22503102 0.81 SCN5A (0.45) HDAC1EPHX2SCN5ASCN9ACA1
SCHEMBL22503271 0.81 PTGS1 (0.50) EPHX2SCN5ASCN9APOLBCA1
SCHEMBL22503119 0.81 TRPV1 (0.50) HDAC1TRPV1HDAC8HDAC6SCN5A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230161252-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-25 US disclosed
US-20230161252-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-25 US disclosed
US-10792489-B2 Bio-electrode composition, bio-electrode, and method for manufacturing the bio-electrode SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-10-06 US disclosed