SCHEMBL2267207

SCHEMBL2267207

COc1c(C(=O)O)c(C(=O)O)c(OC)c(C(=O)O)c1C(=O)O

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HSD17B10 Q99714 2/20 0.54
KDM4E B2RXH2 1/20 0.54
ALDH1A1 P00352 1/20 0.54
CA1 P00915 3/20 0.48
CA2 P00918 3/20 0.48
CA12 O43570 2/20 0.48
CA7 P43166 2/20 0.48
CA9 Q16790 2/20 0.48
CA14 Q9ULX7 2/20 0.48
PTPN1 P18031 1/20 0.44
TPMT P51580 4/20 0.40
MAPT P10636 2/20 0.40
TDP1 Q9NUW8 2/20 0.40
MEN1 O00255 2/20 0.37
KMT2A Q03164 2/20 0.37
CYP2C9 P11712 2/20 0.37
CYP1A2 P05177 2/20 0.37
POLB P06746 1/20 0.36
CYP3A4 P08684 1/20 0.36
HPGD P15428 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL31131475 0.94 HSD17B10 (0.54) HSD17B10KDM4EALDH1A1CA1CA2
SCHEMBL29141732 0.88 HSD17B10 (0.54) HSD17B10KDM4EALDH1A1CA1CA2
SCHEMBL1438740 0.85 HSD17B10 (0.52) HSD17B10KDM4EALDH1A1CA1CA2
SCHEMBL11044033 0.80 ALDH1A1 (0.48) HSD17B10KDM4EALDH1A1CA1CA2
SCHEMBL4359214 0.80 HSD17B10 (0.50) HSD17B10KDM4EALDH1A1CA1CA2
SCHEMBL2646567 0.77 HSD17B10 (0.46) HSD17B10KDM4EALDH1A1CA1CA2
SCHEMBL27549037 0.77 HSD17B10 (0.52) HSD17B10KDM4EALDH1A1CA1CA2
SCHEMBL5589033 0.76 KDM4E (0.45) HSD17B10KDM4EALDH1A1CA1CA2
SCHEMBL5702932 0.76 MEN1 (0.54) HSD17B10KDM4EALDH1A1CA1CA2
SCHEMBL9333813 0.76 PTPN1 (0.64) HSD17B10KDM4EALDH1A1CA1CA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1089129-B1 Positive type photosensitive resin composition, process for producing pattern and electronic parts HITACHI CHEM DUPONT MICROSYS (JP) 2007-06-13 EP claimed
US-6436593-B1 A POLYIMIDE PRECURSOR OR A POLYOXAZOLE PRECURSOR HAVING A GROUP REPRESENTED BY--OR, ACID GENERATION WITH RADIATION HITACHI CHEMICAL DUPONT MICROSYSTEMS LTD. (JP) 2002-08-20 US claimed
EP-1089129-A1 Positive type photosensitive resin composition, process for producing pattern and electronic parts Hitachi Chemical DuPont MicroSystems Ltd. (JP) 2001-04-04 EP claimed
US-11021441-B2 High solubility thioether quinones WISCONSIN ALUMNI RESEARCH FOUNDATION (US) 2021-06-01 US disclosed
US-20200223794-A1 High Solubility Thioether Quinones WISCONSIN ALUMNI RESEARCH FOUNDATION 2020-07-16 US disclosed
US-20190055193-A1 High-Solubility Thioether Quinones U.S. DEPARTMENT OF ENERGY 2019-02-21 US disclosed
US-9334368-B2 Polyimide precursor solution composition UBE INDUSTRIES, LTD. (JP) 2016-05-10 US disclosed
US-20110193016-A1 POLYIMIDE PRECURSOR SOLUTION COMPOSITION UBE INDUSTRIES, LTD. (JP) 2011-08-11 US disclosed
US-20090071693-A1 NEGATIVE PHOTOSENSITIVE MATERIAL AND CIRCUIT BOARD MITSUI CHEMICALS, INC. (JP) 2009-03-19 US disclosed
EP-1089129-B1 Positive type photosensitive resin composition, process for producing pattern and electronic parts HITACHI CHEM DUPONT MICROSYS (JP) 2007-06-13 EP disclosed
US-6482569-B1 Process for forming a polyimide pattern with photosensitive composition for i-line stepper ASAHI KASEI KABUSHIKI KAISHA (JP) 2002-11-19 US disclosed
EP-0718696-B1 Photosensitive polyimide precursor composition ASAHI CHEMICAL IND (JP) 2002-01-16 EP disclosed
EP-1089129-A1 Positive type photosensitive resin composition, process for producing pattern and electronic parts Hitachi Chemical DuPont MicroSystems Ltd. (JP) 2001-04-04 EP disclosed
US-6162580-A Photosensitive polyimide precursor compositions processable by exposure to short wavelength light ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) 2000-12-19 US disclosed
EP-0580108-B1 A photosensitive polyimide composition ASAHI CHEMICAL IND (JP) 1997-03-12 EP disclosed
EP-0718696-A2 A photosensitive polyimide composition ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) 1996-06-26 EP disclosed
EP-0580108-A2 A photosensitive polyimide composition ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) 1994-01-26 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11021441-B2 High solubility thioether quinones SQOR, TST, NDUFS3 HSD17B10 329/4885KDM4E 2805/4885ALDH1A1 277/4885
US-20200223794-A1 High Solubility Thioether Quinones SQOR, TST, NDUFS3 HSD17B10 329/4885KDM4E 2805/4885ALDH1A1 277/4885
US-20190055193-A1 High-Solubility Thioether Quinones SQOR, TST, NDUFS3 HSD17B10 239/4885KDM4E 2750/4885ALDH1A1 273/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.