SCHEMBL2267690

SCHEMBL2267690

C=C([SiH3])c1ccccc1N(C)C

nearest known ligand 0.57

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 4/20 0.57
GAA P10253 3/20 0.57
TSHR P16473 2/20 0.57
ALDH1A1 P00352 2/20 0.57
SMN1; SMN2 Q16637 2/20 0.57
TP53 P04637 1/20 0.57
CNR2 P34972 2/20 0.40
KDM4E B2RXH2 1/20 0.37
CHEK1 O14757 1/20 0.36
NEK2 P51955 1/20 0.36
LIMK1 P53667 1/20 0.36
DYRK1A Q13627 1/20 0.36
CLK4 Q9HAZ1 1/20 0.36
KMT2A Q03164 2/20 0.35
MEN1 O00255 1/20 0.35
EP300 Q09472 1/20 0.35
KAT2B Q92831 1/20 0.35
KAT8 Q9H7Z6 1/20 0.35
LMNA P02545 2/20 0.33
HTR6 P50406 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8924902 0.82 MAPT (0.61) MAPTGAATSHRALDH1A1SMN1; SMN2
SCHEMBL29365484 0.82 MAPT (0.61) MAPTGAATSHRALDH1A1SMN1; SMN2
SCHEMBL2100175 0.82 GAA (0.42) MAPTGAATSHRALDH1A1SMN1; SMN2
SCHEMBL8578207 0.80 GAA (0.59) MAPTGAATSHRALDH1A1SMN1; SMN2
SCHEMBL2277488 0.78 TP53 (0.34) MAPTGAATSHRALDH1A1SMN1; SMN2
SCHEMBL19685318 0.77 MAPT (0.55) MAPTGAATSHRALDH1A1SMN1; SMN2
SCHEMBL2491643 0.77 MAPT (0.67) MAPTGAATSHRALDH1A1SMN1; SMN2
SCHEMBL23940172 0.75 MAPT (0.53) MAPTGAATSHRALDH1A1SMN1; SMN2
SCHEMBL24050331 0.75 GAA (0.53) MAPTGAATSHRALDH1A1SMN1; SMN2
SCHEMBL9126623 0.75 MEN1 (0.55) MAPTGAATSHRALDH1A1SMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8404584-B2 Method of manufacturing semiconductor device FUJITSU LIMITED (JP) 2013-03-26 US disclosed
US-20110207319-A1 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE FUJITSU LIMITED (JP) 2011-08-25 US disclosed