Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 2/20 | 0.33 |
| ▸ | LMNA | P02545 | 1/20 | 0.33 |
| ▸ | THRB | P10828 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2267603 | 0.95 | LMNA (0.30) | TSHRLMNA | |
| SCHEMBL2271878 | 0.89 | LMNA (0.30) | TSHRLMNA | |
| SCHEMBL2270112 | 0.85 | — | — | |
| SCHEMBL2269320 | 0.81 | — | — | |
| SCHEMBL2100415 | 0.77 | TSHR (0.33) | TSHRLMNATHRB | |
| SCHEMBL2099754 | 0.77 | TSHR (0.33) | TSHRLMNATHRB | |
| SCHEMBL9950371 | 0.74 | TSHR (0.32) | TSHRLMNATHRB | |
| SCHEMBL2271868 | 0.74 | TSHR (0.32) | TSHRLMNATHRB | |
| SCHEMBL2102805 | 0.74 | TSHR (0.32) | TSHRLMNATHRB | |
| SCHEMBL28339433 | 0.74 | ALDH1A1 (0.33) | TSHRLMNATHRB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-111886676-B | Method for treating surface of wafer and composition therefor | 中央硝子株式会社 | 2024-09-27 | — | — | CN | claimed |
| US-11670512-B2 | Selective deposition on silicon containing surfaces | VERSUM MATERIALS US, LLC (US) | 2023-06-06 | — | — | US | claimed |
| CN-110612364-B | Selective deposition on silicon-containing surfaces | 弗萨姆材料美国有限责任公司 | 2022-04-05 | — | — | CN | claimed |
| US-20210118684-A1 | SELECTIVE DEPOSITION ON SILICON CONTAINING SURFACES | VERSUM MATERIALS US, LLC | 2021-04-22 | — | — | US | claimed |
| CN-110612364-A | Selective deposition on silicon-containing surfaces | 弗萨姆材料美国有限责任公司 | 2019-12-24 | — | — | CN | claimed |
| WO-2018170382-A1 | SELECTIVE DEPOSITION ON SILICON CONTAINING SURFACES | VERSUM MATERIALS US, LLC (US) | 2018-09-20 | — | — | WO | claimed |
| US-11670512-B2 | Selective deposition on silicon containing surfaces | VERSUM MATERIALS US, LLC (US) | 2023-06-06 | — | — | US | disclosed |
| CN-110612364-B | Selective deposition on silicon-containing surfaces | 弗萨姆材料美国有限责任公司 | 2022-04-05 | — | — | CN | disclosed |
| US-20210118684-A1 | SELECTIVE DEPOSITION ON SILICON CONTAINING SURFACES | VERSUM MATERIALS US, LLC | 2021-04-22 | — | — | US | disclosed |
| CN-110612364-A | Selective deposition on silicon-containing surfaces | 弗萨姆材料美国有限责任公司 | 2019-12-24 | — | — | CN | disclosed |
| US-8404584-B2 | Method of manufacturing semiconductor device | FUJITSU LIMITED (JP) | 2013-03-26 | — | — | US | disclosed |
| US-20110207319-A1 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2011-08-25 | — | — | US | disclosed |