SCHEMBL2270019

SCHEMBL2270019

CCCC[SiH2]CCCC(Cl)N(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7677978 0.82
SCHEMBL2269149 0.82
Hydrochloric Acid SCHEMBL10478914 0.80 DNM1 (0.36)
SCHEMBL2274749 0.78 DNM1 (0.32)
SCHEMBL29080710 0.78 LMNA (0.41)
SCHEMBL27839880 0.78 LMNA (0.41)
Hydrochloric Acid SCHEMBL31303727 0.78 DNM1 (0.39)
SCHEMBL8108578 0.77
Hydrochloric Acid SCHEMBL30570482 0.76 DNM1 (0.42)
Hydrochloric Acid SCHEMBL7371837 0.74

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8404584-B2 Method of manufacturing semiconductor device FUJITSU LIMITED (JP) 2013-03-26 US disclosed
US-20110207319-A1 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE FUJITSU LIMITED (JP) 2011-08-25 US disclosed