SCHEMBL2274008

SCHEMBL2274008

CCN(CC)[SiH2]CCC(c1ccccc1)c1ccccc1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SIGMAR1 Q99720 2/20 0.50
HRH1 P35367 7/20 0.47
HTR2A P28223 6/20 0.47
TDP1 Q9NUW8 1/20 0.39
CYP3A4 P08684 2/20 0.39
LMNA P02545 2/20 0.39
CHRM2 P08172 1/20 0.39
HTR1A P08908 1/20 0.39
ADRA2A P08913 1/20 0.39
ADORA3 P0DMS8 1/20 0.39
CHRM1 P11229 1/20 0.39
SMPD1 P17405 1/20 0.39
DRD1 P21728 1/20 0.39
TBXA2R P21731 1/20 0.39
SLC6A2 P23975 1/20 0.39
SLC6A4 P31645 1/20 0.39
ADRA1A P35348 1/20 0.39
OPRM1 P35372 1/20 0.39
DRD3 P35462 1/20 0.39
CASR P41180 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2272899 0.80 HRH1 (0.55) SIGMAR1HRH1HTR2ATDP1CYP3A4
SCHEMBL107889 0.74 HRH1 (0.56) SIGMAR1HRH1HTR2ATDP1CYP3A4
SCHEMBL707328 0.73 HRH1 (0.50) SIGMAR1HRH1HTR2ACYP3A4LMNA
Hydrochloric Acid SCHEMBL6521685 0.72 HRH1 (0.54) SIGMAR1HRH1HTR2ATDP1CYP3A4
Hydrogen Peroxide SCHEMBL27864054 0.72 HRH1 (0.54) SIGMAR1HRH1HTR2ATDP1CYP3A4
Ammonia Solution, Strong SCHEMBL5724927 0.72 HRH1 (0.54) SIGMAR1HRH1HTR2ATDP1CYP3A4
SCHEMBL28229621 0.72 HRH1 (0.54) SIGMAR1HRH1HTR2ATDP1CYP3A4
Ethylene SCHEMBL28169737 0.70 HRH1 (0.52) SIGMAR1HRH1HTR2ATDP1CYP3A4
SCHEMBL6001616 0.69 SIGMAR1 (0.78) SIGMAR1HRH1HTR2ATDP1CYP3A4
SCHEMBL2271017 0.69 KCNH2 (0.53) SIGMAR1CHRM2HTR1AADRA2ACHRM1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8404584-B2 Method of manufacturing semiconductor device FUJITSU LIMITED (JP) 2013-03-26 US disclosed
US-20110207319-A1 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE FUJITSU LIMITED (JP) 2011-08-25 US disclosed