SCHEMBL707328

SCHEMBL707328

F[SiH2]CCC(c1ccccc1)c1ccccc1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HRH1 P35367 7/20 0.50
HTR2A P28223 7/20 0.50
KCNH2 Q12809 4/20 0.45
CYP3A4 P08684 2/20 0.45
HTR1A P08908 2/20 0.45
ADORA3 P0DMS8 2/20 0.45
SLC6A2 P23975 2/20 0.45
SLC6A4 P31645 2/20 0.45
ADRA1A P35348 2/20 0.45
OPRM1 P35372 2/20 0.45
DRD3 P35462 2/20 0.45
SLC6A3 Q01959 2/20 0.45
CHRM2 P08172 1/20 0.45
ADRA2A P08913 1/20 0.45
CHRM1 P11229 1/20 0.45
SMPD1 P17405 1/20 0.45
DRD1 P21728 1/20 0.45
TBXA2R P21731 1/20 0.45
CASR P41180 1/20 0.45
HTR2B P41595 1/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL704483 0.76 HRH1 (0.50) HRH1HTR2AKCNH2CYP3A4HTR1A
SCHEMBL705991 0.76 HRH1 (0.50) HRH1HTR2AKCNH2CYP3A4HTR1A
SCHEMBL9242182 0.76 HRH1 (0.50) HRH1HTR2AKCNH2CYP3A4HTR1A
SCHEMBL3290730 0.76 HRH1 (0.68) HRH1HTR2AKCNH2CYP3A4HTR1A
SCHEMBL2272197 0.76 HRH1 (0.55) HRH1HTR2AKCNH2CYP3A4HTR1A
SCHEMBL706960 0.75 HTR2A (0.46) HRH1HTR2AKCNH2CYP3A4HTR1A
SCHEMBL2732016 0.73 HRH1 (0.65) HRH1HTR2AKCNH2CYP3A4HTR1A
SCHEMBL844862 0.73 HRH1 (0.65) HRH1HTR2AKCNH2CYP3A4HTR1A
SCHEMBL2274008 0.73 SIGMAR1 (0.50) HRH1HTR2AKCNH2CYP3A4HTR1A
SCHEMBL2272809 0.73 HRH1 (0.47) HRH1HTR2AKCNH2CYP3A4HTR1A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8124239-B2 Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same FUJITSU LIMITED (JP) 2012-02-28 US disclosed
US-20100155121-A1 SILICA FILM FORMING MATERIAL, SILICA FILM AND METHOD OF MANUFACTURING THE SAME, MULTILAYER WIRING STRUCTURE AND METHOD OF MANUFACTURING THE SAME, AND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME FUJITSU LIMITED (JP) 2010-06-24 US disclosed
US-7659357-B2 Precursor organosilicon polymer of 1,2-Bis(dimethylethoxysilyl)ethane, 1,4-bis(dimethylethoxysilyl)benzene, tetraethoxysilane, methyltriethoxysilane, phenyltriethoxysilane; dielectric (DE) films having etching/chemical/moisture resistance; adhesion; low DE constant; minimal wiring delay; high speed FUJITSU LIMITED (JP) 2010-02-09 US disclosed
US-20070026689-A1 Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same FUJITSU LIMITED (JP) 2007-02-01 US disclosed