Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TAS1R3 | Q7RTX0 | 2/20 | 0.39 |
| ▸ | TAS1R1 | Q7RTX1 | 2/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.34 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.34 |
| ▸ | MEN1 | O00255 | 1/20 | 0.34 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.34 |
| ▸ | TSHR | P16473 | 2/20 | 0.33 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.33 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL701485 | 0.82 | ALDH1A1 (0.41) | ALDH1A1CYP1A2KMT2ATSHRL3MBTL1 | |
| SCHEMBL9057994 | 0.81 | TAS1R3 (0.35) | TAS1R3TAS1R1ALDH1A1L3MBTL1 | |
| SCHEMBL7900944 | 0.79 | CYP2C9 (0.47) | ALDH1A1L3MBTL1 | |
| SCHEMBL32691849 | 0.76 | ALDH1A1 (0.50) | ALDH1A1CYP1A2TSHRTDP1L3MBTL1 | |
| SCHEMBL13101222 | 0.76 | TDP1 (0.39) | TAS1R3TAS1R1ALDH1A1CYP1A2MEN1 | |
| SCHEMBL10920744 | 0.72 | CTSS (0.35) | ALDH1A1CYP1A2MEN1KMT2ATSHR | |
| SCHEMBL897715 | 0.71 | ALDH1A1 (0.44) | TAS1R3TAS1R1ALDH1A1CYP1A2KMT2A | |
| SCHEMBL20534751 | 0.70 | ALDH1A1 (0.42) | ALDH1A1CYP1A2MEN1KMT2ATSHR | |
| SCHEMBL119698 | 0.69 | MAPT (0.47) | ALDH1A1CYP1A2KMT2A | |
| SCHEMBL10988395 | 0.69 | MAPT (0.40) | ALDH1A1KMT2ATSHRL3MBTL1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7989155-B2 | Lithographic method | NXP B.V. (NL) | 2011-08-02 | — | — | US | disclosed |
| US-20090130611-A1 | Lithographic Method | NXP B.V. (NL) | 2009-05-21 | — | — | US | disclosed |
| EP-1927030-A1 | LITHOGRAPHIC METHOD | NXP B.V. (NL) | 2008-06-04 | — | — | EP | disclosed |
| WO-2007029177-A1 | LITHOGRAPHIC METHOD | NXP B.V. (NL) | 2007-03-15 | — | — | WO | disclosed |
| US-5545509-A | INTEGRATED CIRCUITS; HIGH DENSITY | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1996-08-13 | — | — | US | disclosed |
| EP-0599571-B1 | Photoresist composition | IBM (US) | 1996-03-27 | — | — | EP | disclosed |
| EP-0599571-A2 | Photoresist composition | International Business Machines Corporation (US) | 1994-06-01 | — | — | EP | disclosed |