Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP2A6 | P11509 | 2/20 | 0.38 |
| ▸ | CYP2B6 | P20813 | 1/20 | 0.38 |
| ▸ | DAPK3 | O43293 | 1/20 | 0.36 |
| ▸ | PRKD3 | O94806 | 1/20 | 0.36 |
| ▸ | MAP4K4 | O95819 | 1/20 | 0.36 |
| ▸ | ABL1 | P00519 | 1/20 | 0.36 |
| ▸ | NTRK1 | P04629 | 1/20 | 0.36 |
| ▸ | LCK | P06239 | 1/20 | 0.36 |
| ▸ | CSF1R | P07333 | 1/20 | 0.36 |
| ▸ | RET | P07949 | 1/20 | 0.36 |
| ▸ | MET | P08581 | 1/20 | 0.36 |
| ▸ | PDGFRB | P09619 | 1/20 | 0.36 |
| ▸ | FGFR1 | P11362 | 1/20 | 0.36 |
| ▸ | PDGFRA | P16234 | 1/20 | 0.36 |
| ▸ | PRKACA | P17612 | 1/20 | 0.36 |
| ▸ | FLT1 | P17948 | 1/20 | 0.36 |
| ▸ | LTK | P29376 | 1/20 | 0.36 |
| ▸ | KDR | P35968 | 1/20 | 0.36 |
| ▸ | MAP2K2 | P36507 | 1/20 | 0.36 |
| ▸ | MAPK8 | P45983 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29217102 | 0.78 | DAPK3 (0.43) | CYP2A6CYP2B6DAPK3PRKD3MAP4K4 | |
| SCHEMBL10568574 | 0.78 | PTGS1 (0.49) | CYP2A6CYP2B6DAPK3PRKD3MAP4K4 | |
| SCHEMBL6036925 | 0.76 | BACE1 (0.41) | CYP2A6CYP2B6DAPK3PRKD3MAP4K4 | |
| SCHEMBL12912902 | 0.76 | CYP2A6 (0.43) | CYP2A6CYP2B6DAPK3PRKD3MAP4K4 | |
| SCHEMBL8219401 | 0.74 | ALDH1A1 (0.49) | CYP2A6CYP2B6DAPK3PRKD3MAP4K4 | |
| SCHEMBL11678420 | 0.74 | CYP2A6 (0.38) | CYP2A6CYP2B6DAPK3PRKD3MAP4K4 | |
| Phosphine SCHEMBL28718427 | 0.74 | BACE1 (0.41) | CYP2A6CYP2B6DAPK3PRKD3MAP4K4 | |
| SCHEMBL27836567 | 0.74 | CYP2A6 (0.47) | CYP2A6CYP2B6DAPK3PRKD3MAP4K4 | |
| SCHEMBL12912881 | 0.72 | ALDH1A1 (0.37) | CYP2A6CYP2B6DAPK3PRKD3MAP4K4 | |
| SCHEMBL12912904 | 0.72 | ALDH1A1 (0.37) | CYP2A6CYP2B6DAPK3PRKD3MAP4K4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6696216-B2 | A PHOTO ACID GENERATOR USED IN GENERATING AN ACID FOR CHEMICALLY CLEAVING ACID SENSITIVE SIDE CHAINS OF A CHEMICALLY AMPLIFIED BASE POLYMER CONTAINS A SULFONIUM OR IODONIUM SALT CONTAINING ATLEAST ONE THIOPHENE RING | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2004-02-24 | — | — | US | claimed |
| US-20030008230-A1 | Thiophene-containing photo acid generators for photolithography | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2003-01-09 | — | — | US | claimed |
| WO-2003003120-A1 | THIOPHENE-CONTAINING PHOTO ACID GENERATORS FOR PHOTOLITHOGRAPHY | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2003-01-09 | — | — | WO | claimed |
| US-11339231-B2 | Olefin-based resin composition, manufacturing method therefor, and molded article thereof | ADEKA CORPORATION (JP) | 2022-05-24 | — | — | US | disclosed |
| US-20200317830-A1 | OLEFIN-BASED RESIN COMPOSITION, MANUFACTURING METHOD THEREFOR, AND MOLDED ARTICLE THEREOF | ADEKA CORPORATION (JP) | 2020-10-08 | — | — | US | disclosed |
| CN-109863156-A | Novel compound, composition using same, olefin resin composition, molded article thereof, and method for improving impact resistance of molded article | 株式会社ADEKA | 2019-06-07 | — | — | CN | disclosed |
| US-9535325-B2 | Onium salt, chemically amplified positive resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-01-03 | — | — | US | disclosed |
| CN-103781813-B | The epoxy resin adduct mixed | 蓝立方知识产权有限责任公司 | 2016-09-14 | — | — | CN | disclosed |
| US-9329476-B2 | Chemically amplified negative resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-05-03 | — | — | US | disclosed |
| US-20150198876-A1 | ONIUM SALT, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-07-16 | — | — | US | disclosed |
| US-20150198877-A1 | CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-07-16 | — | — | US | disclosed |
| US-8795942-B2 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-08-05 | — | — | US | disclosed |
| US-8283104-B2 | Sulfonate and its derivative, photosensitive acid generator, and resist composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-10-09 | — | — | US | disclosed |
| US-20110189607-A1 | NOVEL SULFONIUM SALT, POLYMER, METHOD FOR PRODUCING THE POLYMER, RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-08-04 | — | — | US | disclosed |
| US-20100209827-A1 | NOVEL SULFONATE AND ITS DERIVATIVE, PHOTOSENSITIVE ACID GENERATOR, AND RESIST COMPOSITION AND PATTERNING PROCESS USING THE SAME | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-08-19 | — | — | US | disclosed |
| US-20080153030-A1 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-06-26 | — | — | US | disclosed |
| US-6696216-B2 | A PHOTO ACID GENERATOR USED IN GENERATING AN ACID FOR CHEMICALLY CLEAVING ACID SENSITIVE SIDE CHAINS OF A CHEMICALLY AMPLIFIED BASE POLYMER CONTAINS A SULFONIUM OR IODONIUM SALT CONTAINING ATLEAST ONE THIOPHENE RING | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2004-02-24 | — | — | US | disclosed |
| US-20030008230-A1 | Thiophene-containing photo acid generators for photolithography | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2003-01-09 | — | — | US | disclosed |
| WO-2003003120-A1 | THIOPHENE-CONTAINING PHOTO ACID GENERATORS FOR PHOTOLITHOGRAPHY | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2003-01-09 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20110189607-A1 | NOVEL SULFONIUM SALT, POLYMER, METHOD FOR PRODUCING THE POLYMER, RESIST COMPOSITION AND PATTERNING PROCESS | RPS4Y1, ETV6, RPS4X | CYP2A6 4058/4885CYP2B6 3846/4885DAPK3 4507/4885 |
| US-20100209827-A1 | NOVEL SULFONATE AND ITS DERIVATIVE, PHOTOSENSITIVE ACID GENERATOR, AND RESIST COMPOSITION AND PATTERNING PROCESS USING THE SAME | DAP3, MRPS23, ASIC3 | CYP2A6 2299/4885CYP2B6 2015/4885DAPK3 729/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.