SCHEMBL22876775

SCHEMBL22876775

CC(C)CC(C)(C(=O)Oc1ccccc1I)C(C)C

nearest known ligand 0.39

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
▸ ELANE P08246 7/20 0.39
▸ FABP7 O15540 1/20 0.36
▸ FABP3 P05413 1/20 0.36
▸ FABP5 Q01469 1/20 0.36
▸ AAK1 Q2M2I8 2/20 0.33
▸ ALDH1A1 P00352 3/20 0.32
▸ KDM4E B2RXH2 1/20 0.32
▸ HSD17B10 Q99714 1/20 0.32
▸ HTT P42858 1/20 0.32
▸ GAA P10253 1/20 0.32
▸ SMN1; SMN2 Q16637 1/20 0.32
▸ SLC25A5 P05141 1/20 0.32
▸ LMNA P02545 1/20 0.32
▸ MAPT P10636 1/20 0.32
▸ NPSR1 Q6W5P4 1/20 0.32
▸ MTNR1A P48039 1/20 0.31
▸ MTNR1B P49286 1/20 0.31
▸ ACHE P22303 1/20 0.31
▸ TSHR P16473 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24717025 0.87 ELANE (0.40) ELANEFABP7FABP3FABP5ALDH1A1
SCHEMBL25007065 0.84 ELANE (0.38) ELANEFABP7FABP3FABP5KDM4E
SCHEMBL25139350 0.77 ESR1 (0.46) ELANEAAK1ALDH1A1HSD17B10GAA
SCHEMBL28370638 0.76 ELANE (0.62) ELANEFABP7FABP3FABP5LMNA
SCHEMBL26458262 0.75 ELANE (0.31) ELANE
SCHEMBL25469952 0.75 — —
SCHEMBL19954365 0.74 CYP1A2 (0.45) ELANEGAASMN1; SMN2LMNAMAPT
SCHEMBL25468121 0.74 ELANE (0.44) ELANEFABP7FABP3FABP5ALDH1A1
SCHEMBL21659433 0.73 KMT2A (0.44) ALDH1A1KDM4EHSD17B10GAASMN1; SMN2
SCHEMBL19954364 0.73 ELANE (0.49) ELANEALDH1A1KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11703758-B2 Photosensitive composition for EUV light, pattern forming method, and method for manufacturing electronic device FUJIFILM CORPORATION (JP) 2023-07-18 — — US disclosed
US-20210011377-A1 PHOTOSENSITIVE COMPOSITION FOR EUV LIGHT, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2021-01-14 — — US disclosed
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