SCHEMBL25007065

SCHEMBL25007065

CCCC(C)(C(=O)Oc1ccccc1I)C(C)C

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ELANE P08246 7/20 0.38
▸ FABP7 O15540 1/20 0.35
▸ FABP3 P05413 1/20 0.35
▸ FABP5 Q01469 1/20 0.35
▸ KDM4E B2RXH2 2/20 0.34
▸ MEN1 O00255 2/20 0.34
▸ KMT2A Q03164 2/20 0.34
▸ RECQL P46063 1/20 0.34
▸ SCN1A P35498 3/20 0.33
▸ SCN2A Q99250 3/20 0.33
▸ SCN3A Q9NY46 3/20 0.33
▸ LMNA P02545 2/20 0.33
▸ CYP1A2 P05177 2/20 0.33
▸ CYP3A4 P08684 2/20 0.33
▸ CYP2D6 P10635 2/20 0.33
▸ CYP2C9 P11712 2/20 0.33
▸ CYP2C19 P33261 2/20 0.33
▸ TSHR P16473 1/20 0.33
▸ NFKB1 P19838 1/20 0.33
▸ MTOR P42345 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24717025 0.89 ELANE (0.40) ELANEFABP7FABP3FABP5KDM4E
SCHEMBL22876775 0.84 ELANE (0.39) ELANEFABP7FABP3FABP5KDM4E
SCHEMBL25468121 0.76 ELANE (0.44) ELANEFABP7FABP3FABP5KDM4E
SCHEMBL28370638 0.75 ELANE (0.62) ELANEFABP7FABP3FABP5LMNA
SCHEMBL8207207 0.72 MEN1 (0.51) FABP7FABP3FABP5KDM4EMEN1
SCHEMBL4246889 0.72 ELANE (0.46) ELANEFABP7FABP3FABP5KDM4E
SCHEMBL29435434 0.72 ELANE (0.46) ELANEFABP7FABP3FABP5KDM4E
SCHEMBL10098427 0.71 ALDH1A1 (0.47) MEN1KMT2ALMNACYP3A4TSHR
SCHEMBL370102 0.70 KMT2A (0.65) FABP7FABP3FABP5KDM4EMEN1
SCHEMBL25519396 0.70 KMT2A (0.43) FABP7FABP3FABP5KDM4EMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4130879-A1 MANUFACTURING METHOD FOR RESIST COMPOSITION AND PATTERN FORMING METHOD FUJIFILM Corporation (JP) 2023-02-08 — — EP disclosed
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