SCHEMBL26458262

SCHEMBL26458262

CC(C)CC(C)(C(=O)Oc1cc(I)c(I)c(I)c1)C(C)C

nearest known ligand 0.31

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
▸ ELANE P08246 3/20 0.31
▸ TPMT P51580 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14839101 0.81 HMGCR (0.33) ELANE
SCHEMBL14838551 0.78 SCN9A (0.41) —
SCHEMBL19901519 0.78 POLB (0.44) ELANE
SCHEMBL19954364 0.77 ELANE (0.49) ELANE
SCHEMBL22876775 0.75 ELANE (0.39) ELANE
SCHEMBL21701065 0.75 MLYCD (0.36) —
SCHEMBL18487391 0.75 MAPT (0.45) ELANE
SCHEMBL21659433 0.74 KMT2A (0.44) —
SCHEMBL12970247 0.74 KMT2A (0.42) ELANE
SCHEMBL23808373 0.73 ELANE (0.51) ELANE

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230139009-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2023-05-04 — — US disclosed
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