⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL25468115 | 0.78 | KDM4E (0.30) | — | |
| SCHEMBL22876775 | 0.75 | ELANE (0.39) | — | |
| SCHEMBL26458262 | 0.73 | ELANE (0.31) | — | |
| SCHEMBL25699178 | 0.72 | MAPT (0.33) | — | |
| SCHEMBL24909141 | 0.68 | ELANE (0.36) | — | |
| SCHEMBL21251186 | 0.68 | MAPK1 (0.48) | — | |
| SCHEMBL15935717 | 0.68 | MMP8 (0.37) | — | |
| SCHEMBL22876778 | 0.66 | MAPT (0.35) | — | |
| SCHEMBL14839101 | 0.66 | HMGCR (0.33) | — | |
| SCHEMBL10243710 | 0.66 | DGAT1 (0.45) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230148344-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, RESIST FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, COMPOUND, AND METHOD FOR PRODUCING COMPOUND | FUJIFILM CORPORATION (JP) | 2023-05-11 | — | — | US | disclosed |