SCHEMBL2293678

SCHEMBL2293678

CS(C)(C)OOS(c1ccccc1)(c1ccccc1)c1ccccc1

nearest known ligand 0.36

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HTR6 P50406 2/20 0.36
PSIP1 O75475 1/20 0.36
CA4 P22748 2/20 0.33
CA1 P00915 2/20 0.33
CA2 P00918 2/20 0.33
ALDH1A1 P00352 1/20 0.33
HSD17B10 Q99714 1/20 0.33
TDP1 Q9NUW8 1/20 0.33
CA12 O43570 1/20 0.33
CA3 P07451 1/20 0.33
CA6 P23280 1/20 0.33
CA5A P35218 1/20 0.33
CA7 P43166 1/20 0.33
PLA2G7 Q13093 1/20 0.33
CA9 Q16790 1/20 0.33
CA13 Q8N1Q1 1/20 0.33
CA14 Q9ULX7 1/20 0.33
CA5B Q9Y2D0 1/20 0.33
TSHR P16473 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2090405 0.70 CA4 (0.41) HTR6PSIP1CA4CA1CA2
SCHEMBL26136335 0.69 HTR6 (0.45) HTR6PSIP1CA4CA1CA2
SCHEMBL207124 0.68 HTR6 (0.46) HTR6PSIP1CA4CA1CA2
SCHEMBL20344806 0.67 ALDH1A1 (0.52) HTR6PSIP1CA4CA1CA2
SCHEMBL3253436 0.66 HTR6 (0.47) HTR6PSIP1CA4CA1CA2
SCHEMBL20419428 0.66 HTR6 (0.47) HTR6PSIP1CA4CA1CA2
SCHEMBL5607138 0.66 HTR6 (0.47) HTR6PSIP1CA4CA1CA2
SCHEMBL2937203 0.66 HTR6 (0.47) HTR6PSIP1CA4CA1CA2
SCHEMBL27743365 0.65 MAPK1 (0.37) HTR6PSIP1CA4CA1CA2
SCHEMBL15671122 0.65 PSIP1 (0.46) HTR6PSIP1ALDH1A1HSD17B10TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7989136-B2 Photoresist composition and method of forming a photoresist pattern using the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2011-08-02 US claimed
US-20090042127-A1 PHOTORESIST COMPOSITION AND METHOD OF FORMING A PHOTORESIST PATTERN USING THE SAME SAMSUNG ELECTRONICS CO., LTD. (KR) 2009-02-12 US claimed