Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.39 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.39 |
| ▸ | MAPT | P10636 | 1/20 | 0.39 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5161337 | 1.00 | ALDH1A1 (0.39) | ALDH1A1CYP3A4MAPTCYP2D6 | |
| Hydrochloric Acid SCHEMBL10778837 | 0.98 | ALDH1A1 (0.42) | ALDH1A1CYP3A4MAPTCYP2D6 | |
| Hydrochloric Acid SCHEMBL10778844 | 0.98 | ALDH1A1 (0.42) | ALDH1A1CYP3A4MAPTCYP2D6 | |
| Hydrochloric Acid SCHEMBL10782209 | 0.79 | ALDH1A1 (0.39) | ALDH1A1CYP3A4MAPTCYP2D6 | |
| SCHEMBL3864537 | 0.76 | ALDH1A1 (0.36) | ALDH1A1CYP3A4MAPTCYP2D6 | |
| SCHEMBL3864539 | 0.76 | ALDH1A1 (0.36) | ALDH1A1CYP3A4MAPTCYP2D6 | |
| Hydrochloric Acid SCHEMBL10784283 | 0.76 | GRIN2D (0.37) | ALDH1A1CYP3A4MAPTCYP2D6 | |
| Hydrochloric Acid SCHEMBL306250 | 0.75 | ALDH1A1 (0.39) | ALDH1A1CYP3A4MAPTCYP2D6 | |
| Hydrochloric Acid SCHEMBL1487320 | 0.75 | ALDH1A1 (0.39) | ALDH1A1CYP3A4MAPTCYP2D6 | |
| SCHEMBL7587710 | 0.73 | CTH (0.39) | ALDH1A1CYP3A4MAPTCYP2D6 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2025070165-A1 | PHOTOCURABLE COMPOSITION | サンスター技研株式会社 | 2025-04-03 | — | — | WO | disclosed |
| US-7989563-B2 | Resin compositions, films using the same and process for producing the films | LINTEC CORPORATION (JP) | 2011-08-02 | — | — | US | disclosed |
| US-20090209718-A1 | RESIN COMPOSITIONS, FILMS USING THE SAME AND PROCESS FOR PRODUCING THE FILMS | LINTEC CORPORATION (JP) | 2009-08-20 | — | — | US | disclosed |
| US-20070254976-A1 | Method For Production Of Cement Dispersant And Polycarboxylic Acid Type Polymer For Cement Dispersant | NIPPON SHOKUBAI CO., LTD. (JP) | 2007-11-01 | — | — | US | disclosed |
| US-7230061-B2 | Process for production of water-soluble (meth)acrylic polymers, water-soluble (meth)acrylic polymers, and use thereof | NIPPON SHOKUBAI CO., LTD. (JP) | 2007-06-12 | — | — | US | disclosed |
| EP-1454928-B1 | PROCESS FOR PRODUCTION OF WATER-SOLUBLE (METH)ACRYLIC POLYMERS, WATER-SOLUBLE (METH)ACRYLIC POLYMERS, AND USE THEREOF | NIPPON CATALYTIC CHEM IND (JP) | 2007-02-28 | — | — | EP | disclosed |
| US-20060173088-A1 | Method for production of water-soluble porous polymer and water-soluble porous polymer | NIPPON SHOKUBAI CO., LTD. (JP) | 2006-08-03 | — | — | US | disclosed |
| EP-1646662-A1 | METHOD FOR PRODUCTION OF WATER-SOLUBLE POROUS POLYMER AND WATER-SOLUBLE POROUS POLYMER | Nippon Shokubai Co., Ltd. (JP) | 2006-04-19 | — | — | EP | disclosed |
| WO-2005007713-A1 | METHOD FOR PRODUCTION OF WATER-SOLUBLE POROUS POLYMER AND WATER-SOLUBLE POROUS POLYMER | NIPPON SHOKUBAI CO., LTD. (JP) | 2005-01-27 | — | — | WO | disclosed |
| EP-1454928-A1 | PROCESS FOR PRODUCTION OF WATER−SOLUBLE (METH)ACRYLIC POLYMERS, WATER−SOLUBLE (METH)ACRYLIC POLYMERS, AND USE THEREOF | Nippon Shokubai Co., Ltd. (JP) | 2004-09-08 | — | — | EP | disclosed |
| US-20040110861-A1 | Process for production of water-soluble (meth)acrylic polymers, water-soluble (meth) acrylic polymers, and use thereof | NIPPON SHOKUBAI CO., LTD. (JP) | 2004-06-10 | — | — | US | disclosed |
| US-4260713-A | AZOBIS/N,N*DIMETHYLENEISOBUTYLAMIDINE | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 1981-04-07 | — | — | US | disclosed |