SCHEMBL5161337

SCHEMBL5161337

CCNC(=N)C(C)(C)/N=N/C(C)(C)C(=N)NCC

nearest known ligand 0.39

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.39
CYP3A4 P08684 2/20 0.39
MAPT P10636 1/20 0.39
CYP2D6 P10635 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2296598 1.00 ALDH1A1 (0.39) ALDH1A1CYP3A4MAPTCYP2D6
Hydrochloric Acid SCHEMBL10778837 0.98 ALDH1A1 (0.42) ALDH1A1CYP3A4MAPTCYP2D6
Hydrochloric Acid SCHEMBL10778844 0.98 ALDH1A1 (0.42) ALDH1A1CYP3A4MAPTCYP2D6
Hydrochloric Acid SCHEMBL10782209 0.79 ALDH1A1 (0.39) ALDH1A1CYP3A4MAPTCYP2D6
SCHEMBL3864537 0.76 ALDH1A1 (0.36) ALDH1A1CYP3A4MAPTCYP2D6
SCHEMBL3864539 0.76 ALDH1A1 (0.36) ALDH1A1CYP3A4MAPTCYP2D6
Hydrochloric Acid SCHEMBL10784283 0.76 GRIN2D (0.37) ALDH1A1CYP3A4MAPTCYP2D6
Hydrochloric Acid SCHEMBL306250 0.75 ALDH1A1 (0.39) ALDH1A1CYP3A4MAPTCYP2D6
Hydrochloric Acid SCHEMBL1487320 0.75 ALDH1A1 (0.39) ALDH1A1CYP3A4MAPTCYP2D6
SCHEMBL7587710 0.73 CTH (0.39) ALDH1A1CYP3A4MAPTCYP2D6

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2025070165-A1 PHOTOCURABLE COMPOSITION サンスター技研株式会社 2025-04-03 WO disclosed
US-7230061-B2 Process for production of water-soluble (meth)acrylic polymers, water-soluble (meth)acrylic polymers, and use thereof NIPPON SHOKUBAI CO., LTD. (JP) 2007-06-12 US disclosed
EP-1454928-B1 PROCESS FOR PRODUCTION OF WATER-SOLUBLE (METH)ACRYLIC POLYMERS, WATER-SOLUBLE (METH)ACRYLIC POLYMERS, AND USE THEREOF NIPPON CATALYTIC CHEM IND (JP) 2007-02-28 EP disclosed
US-20060173088-A1 Method for production of water-soluble porous polymer and water-soluble porous polymer NIPPON SHOKUBAI CO., LTD. (JP) 2006-08-03 US disclosed
EP-1454928-A1 PROCESS FOR PRODUCTION OF WATER−SOLUBLE (METH)ACRYLIC POLYMERS, WATER−SOLUBLE (METH)ACRYLIC POLYMERS, AND USE THEREOF Nippon Shokubai Co., Ltd. (JP) 2004-09-08 EP disclosed
US-20040110861-A1 Process for production of water-soluble (meth)acrylic polymers, water-soluble (meth) acrylic polymers, and use thereof NIPPON SHOKUBAI CO., LTD. (JP) 2004-06-10 US disclosed
US-4260713-A AZOBIS/N,N*DIMETHYLENEISOBUTYLAMIDINE WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 1981-04-07 US disclosed