SCHEMBL2298200

SCHEMBL2298200

CC(CC(N)=NCc1ccccc1)N=NC(C)CC(N)=NCc1ccccc1

nearest known ligand 0.54

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
GRIN2B Q13224 13/20 0.54
GRIN1 Q05586 9/20 0.54
NOS2 P35228 1/20 0.53
GRIN2D O15399 3/20 0.45
GRIN3B O60391 3/20 0.45
GRIN2A Q12879 3/20 0.45
GRIN2C Q14957 3/20 0.45
GRIN3A Q8TCU5 3/20 0.45
SIGMAR1 Q99720 3/20 0.45
HIF1A Q16665 1/20 0.41
SCN2A Q99250 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL2569213 0.98 GRIN2B (0.53) GRIN2BGRIN1NOS2GRIN2DGRIN3B
SCHEMBL6831177 0.77 GRIN2B (0.66) GRIN2BGRIN1NOS2GRIN2DGRIN3B
Hydrochloric Acid SCHEMBL4737688 0.76 GRIN2B (0.63) GRIN2BGRIN1NOS2GRIN2DGRIN3B
SCHEMBL4740345 0.74 NOS2 (0.60) GRIN2BGRIN1NOS2GRIN2DGRIN3B
Hydrochloric Acid SCHEMBL16372137 0.74 GRIN2B (0.61) GRIN2BGRIN1NOS2GRIN2DGRIN3B
SCHEMBL5788362 0.73 GRIN2B (0.70) GRIN2BGRIN1NOS2GRIN2DGRIN3B
SCHEMBL14291059 0.71 NOS2 (0.96) GRIN2BGRIN1NOS2GRIN2DGRIN3B
SCHEMBL20675953 0.71 NOS2 (0.96) GRIN2BGRIN1NOS2GRIN2DGRIN3B
SCHEMBL45769 0.71 GRIN2B (0.68) GRIN2BGRIN1NOS2GRIN2DGRIN3B
Hydrochloric Acid SCHEMBL4737504 0.70 NOS2 (0.92) GRIN2BGRIN1NOS2GRIN2DGRIN3B

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7989563-B2 Resin compositions, films using the same and process for producing the films LINTEC CORPORATION (JP) 2011-08-02 US disclosed
US-20090209718-A1 RESIN COMPOSITIONS, FILMS USING THE SAME AND PROCESS FOR PRODUCING THE FILMS LINTEC CORPORATION (JP) 2009-08-20 US disclosed
US-20070254976-A1 Method For Production Of Cement Dispersant And Polycarboxylic Acid Type Polymer For Cement Dispersant NIPPON SHOKUBAI CO., LTD. (JP) 2007-11-01 US disclosed
US-7230061-B2 Process for production of water-soluble (meth)acrylic polymers, water-soluble (meth)acrylic polymers, and use thereof NIPPON SHOKUBAI CO., LTD. (JP) 2007-06-12 US disclosed
EP-1454928-B1 PROCESS FOR PRODUCTION OF WATER-SOLUBLE (METH)ACRYLIC POLYMERS, WATER-SOLUBLE (METH)ACRYLIC POLYMERS, AND USE THEREOF NIPPON CATALYTIC CHEM IND (JP) 2007-02-28 EP disclosed
EP-1454928-A1 PROCESS FOR PRODUCTION OF WATER−SOLUBLE (METH)ACRYLIC POLYMERS, WATER−SOLUBLE (METH)ACRYLIC POLYMERS, AND USE THEREOF Nippon Shokubai Co., Ltd. (JP) 2004-09-08 EP disclosed
US-20040110861-A1 Process for production of water-soluble (meth)acrylic polymers, water-soluble (meth) acrylic polymers, and use thereof NIPPON SHOKUBAI CO., LTD. (JP) 2004-06-10 US disclosed