Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SELL | P14151 | 1/20 | 0.44 |
| ▸ | SELP | P16109 | 1/20 | 0.44 |
| ▸ | ESR1 | P03372 | 1/20 | 0.42 |
| ▸ | ADORA3 | P0DMS8 | 1/20 | 0.42 |
| ▸ | NPY1R | P25929 | 1/20 | 0.42 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.42 |
| ▸ | OPRD1 | P41143 | 1/20 | 0.42 |
| ▸ | MTOR | P42345 | 1/20 | 0.42 |
| ▸ | HK2 | P52789 | 1/20 | 0.42 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.42 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.42 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.42 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.42 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.42 |
| ▸ | THPO | P40225 | 1/20 | 0.42 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL31618870 | 1.00 | SELL (0.44) | SELLSELPESR1ADORA3NPY1R | |
| SCHEMBL28467454 | 0.87 | IAPP (0.49) | SELLSELPESR1ADORA3NPY1R | |
| SCHEMBL8145949 | 0.84 | ESR2 (0.38) | ESR1ADORA3NPY1RPTGS2OPRD1 | |
| SCHEMBL31383406 | 0.83 | IAPP (0.53) | — | |
| SCHEMBL30940438 | 0.83 | AKR1B1 (0.58) | SELLSELPKDM4ETHPOHSD17B10 | |
| SCHEMBL8685874 | 0.83 | AKR1B1 (0.58) | SELLSELPKDM4ETHPOHSD17B10 | |
| SCHEMBL660344 | 0.81 | IAPP (0.46) | SELLSELPESR1ADORA3NPY1R | |
| SCHEMBL28717700 | 0.81 | IAPP (0.56) | ALDH1A1HSD17B10 | |
| SCHEMBL28994842 | 0.81 | SELL (0.41) | SELLSELPESR1ADORA3NPY1R | |
| SCHEMBL6789908 | 0.81 | CA2 (0.45) | SELLSELPESR1ADORA3NPY1R |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20220348698-A1 | COMPOUND, POLYMER, COMPOSITION, COMPOSITION FOR FILM FORMATION, PATTERN FORMATION METHOD, INSULATING FILM FORMATION METHOD, AND METHOD FOR PRODUCING COMPOUND, AS WELL AS METHOD FOR PRODUCING IODINE-CONTAINING VINYL POLYMER AND ACETYLATED DERIVATIVE THEREOF | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2022-11-03 | — | — | US | disclosed |
| CN-114245792-A | Compound, polymer, composition for film formation, method for pattern formation, method for forming insulating film, method for producing compound, and method for producing iodine-containing vinyl polymer and acetylated derivative thereof | 三菱瓦斯化学株式会社 | 2022-03-25 | — | — | CN | disclosed |
| WO-2021029395-A1 | COMPOUND, POLYMER, COMPOSITION, COMPOSITION FOR FILM FORMATION, PATTERN FORMING METHOD, METHOD FOR FORMING INSULATING FILM, METHOD FOR PRODUCING COMPOUND, IODINE-CONTAINING VINYL POLYMER AND METHOD FOR PRODUCING ACETYLATED DERIVATIVE OF SAME | 三菱瓦斯化学株式会社 | 2021-02-18 | — | — | WO | disclosed |