SCHEMBL28717700

SCHEMBL28717700

O=C(Cc1cccc(O)c1O)Cc1cccc(O)c1O

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ IAPP P10997 4/20 0.56
▸ AKR1B1 P15121 1/20 0.50
▸ DBH P09172 1/20 0.48
▸ ADAMTS4 O75173 1/20 0.48
▸ ALDH1A1 P00352 1/20 0.48
▸ EGFR P00533 1/20 0.48
▸ CA1 P00915 1/20 0.48
▸ CA2 P00918 1/20 0.48
▸ LMNA P02545 1/20 0.48
▸ FYN P06241 1/20 0.48
▸ MMP2 P08253 1/20 0.48
▸ MMP9 P14780 1/20 0.48
▸ HPGD P15428 1/20 0.48
▸ ALOX15 P16050 1/20 0.48
▸ MMP8 P22894 1/20 0.48
▸ CA6 P23280 1/20 0.48
▸ CDK2 P24941 1/20 0.48
▸ MMP12 P39900 1/20 0.48
▸ RECQL P46063 1/20 0.48
▸ HSD17B10 Q99714 1/20 0.48

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29829095 0.84 AKR1B1 (0.72) IAPPAKR1B1DBHADAMTS4ALDH1A1
SCHEMBL8791 0.84 AKR1B1 (0.72) IAPPAKR1B1DBHADAMTS4ALDH1A1
SCHEMBL11029713 0.83 GAA (0.53) IAPPAKR1B1DBHADAMTS4ALDH1A1
SCHEMBL31013617 0.83 IAPP (0.67) IAPPAKR1B1DBHADAMTS4ALDH1A1
SCHEMBL1426061 0.83 IAPP (0.67) IAPPAKR1B1DBHADAMTS4ALDH1A1
SCHEMBL22982305 0.81 SELL (0.44) ALDH1A1HSD17B10
SCHEMBL1737314 0.81 AKR1B1 (0.74) AKR1B1ALDH1A1EGFRCA2LMNA
SCHEMBL31618870 0.81 SELL (0.44) ALDH1A1HSD17B10
SCHEMBL30451705 0.81 AKR1B1 (0.74) AKR1B1ALDH1A1EGFRCA2LMNA
SCHEMBL6054330 0.81 IAPP (0.50) IAPPAKR1B1DBHADAMTS4ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-120136704-A Compound, polymer, composition for film formation, pattern formation method, method for forming insulating film, and method for producing compound 三菱瓦斯化学株式会社 2025-06-13 — — CN disclosed
CN-120136703-A Compound, polymer, composition for film formation, pattern formation method, method for forming insulating film, and method for producing compound 三菱瓦斯化学株式会社 2025-06-13 — — CN disclosed
CN-114245792-A Compound, polymer, composition for film formation, method for pattern formation, method for forming insulating film, method for producing compound, and method for producing iodine-containing vinyl polymer and acetylated derivative thereof 三菱瓦斯化学株式会社 2022-03-25 — — CN disclosed
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