SCHEMBL23040262

SCHEMBL23040262

OC(c1cccc([Si](Cl)(Cl)Cl)c1)(C(F)(F)F)C(F)(F)F

nearest known ligand 0.47

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
NR1H3 Q13133 15/20 0.47
NR1H2 P55055 13/20 0.47
AR P10275 1/20 0.38
MEN1 O00255 1/20 0.38
ALOX15 P16050 1/20 0.38
TSHR P16473 1/20 0.38
MAPK1 P28482 1/20 0.38
KMT2A Q03164 1/20 0.38
HSD17B10 Q99714 1/20 0.38
RORC P51449 2/20 0.37
RORA P35398 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23040270 0.86 NR1H3 (0.53) NR1H3NR1H2MEN1ALOX15TSHR
SCHEMBL7734267 0.80 TSHR (0.48) TSHRMAPK1
SCHEMBL832913 0.80 NR1H3 (0.47) NR1H3NR1H2ARMEN1ALOX15
SCHEMBL23040284 0.78 NR1H2 (0.63) NR1H3NR1H2
SCHEMBL23040277 0.77 NR1H3 (0.47) NR1H3NR1H2MEN1ALOX15TSHR
SCHEMBL12441430 0.74 PTPN1 (0.48) NR1H3NR1H2ARMEN1ALOX15
SCHEMBL29509593 0.74 TSHR (0.50) NR1H3NR1H2ARMEN1ALOX15
SCHEMBL24901407 0.74 TSHR (0.50) NR1H3NR1H2ARMEN1ALOX15
SCHEMBL23040287 0.74 NR1H3 (0.46) NR1H3NR1H2RORC
SCHEMBL24901406 0.72 KCNN4 (0.50) NR1H3NR1H2ARMEN1ALOX15

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11881400-B2 Silicon-containing layer-forming composition, and method for producing pattern-equipped substrate which uses same CENTRAL GLASS COMPANY, LIMITED (JP) 2024-01-23 US disclosed
US-20230037301-A1 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN STRUCTURE AND METHOD FOR PRODUCING PATTERNED CURED FILM CENTRAL GLASS COMPANY, LIMITED (JP) 2023-02-09 US disclosed
CN-113166548-A Resin composition, photosensitive resin composition, cured film, method for producing cured film, patterned cured film, and method for producing patterned cured film 中央硝子株式会社 2021-07-23 CN disclosed
US-20210082690-A1 Silicon-Containing Layer-Forming Composition, and Method for Producing Pattern-Equipped Substrate Which Uses Same CENTRAL GLASS COMPANY, LIMITED (JP) 2021-03-18 US disclosed
US-20210061827-A1 Silicon Compound Containing Hexafluoroisopropanol Group, and Method for Producing Same CENTRAL GLASS COMPANY, LIMITED (JP) 2021-03-04 US disclosed
CN-111819183-A Silicon compound containing hexafluoroisopropanol group and method for producing same 中央硝子株式会社 2020-10-23 CN disclosed
CN-111801621-A Silicon-containing layer forming composition and method of manufacturing patterned substrate using the same 中央硝子株式会社 2020-10-20 CN disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20210061827-A1 Silicon Compound Containing Hexafluoroisopropanol Group, and Method for Producing Same FOS, FUBP3, SF3A3 NR1H3 731/4885NR1H2 1383/4885AR 3169/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.