SCHEMBL23045906

SCHEMBL23045906

Nc1ccc(ONc2ccc(-c3cccc(-c4ccc(NOc5ccc(N)cc5)cc4)c3)cc2)cc1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TAAR1 Q96RJ0 2/20 0.46
CYP3A4 P08684 3/20 0.42
TDP1 Q9NUW8 3/20 0.42
HSD17B10 Q99714 1/20 0.42
ALDH1A1 P00352 4/20 0.40
MEN1 O00255 2/20 0.40
KMT2A Q03164 2/20 0.40
SMN1; SMN2 Q16637 2/20 0.40
MITF O75030 1/20 0.40
GAA P10253 1/20 0.40
MAPT P10636 1/20 0.40
GFER P55789 1/20 0.40
NLRP1 Q9C000 1/20 0.40
NOD2 Q9HC29 1/20 0.40
ABL1 P00519 1/20 0.40
ABCB1 P08183 1/20 0.40
BCR P11274 1/20 0.40
PLAU P00749 2/20 0.39
MAOA P21397 1/20 0.38
TP53 P04637 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20679041 0.83 NR4A1 (0.50) CYP3A4TDP1ALDH1A1MEN1KMT2A
SCHEMBL1098556 0.77 ALDH1A1 (0.65) TAAR1CYP3A4TDP1HSD17B10ALDH1A1
SCHEMBL8622331 0.77 MAPT (0.52) TAAR1CYP3A4TDP1HSD17B10ALDH1A1
SCHEMBL29006124 0.77 MAPT (0.52) TAAR1CYP3A4TDP1HSD17B10ALDH1A1
SCHEMBL14309787 0.77 TAAR1 (0.70) TAAR1CYP3A4TDP1HSD17B10ALDH1A1
SCHEMBL14302425 0.77 TAAR1 (0.70) TAAR1CYP3A4TDP1HSD17B10ALDH1A1
SCHEMBL309757 0.77 TAAR1 (0.70) TAAR1CYP3A4TDP1HSD17B10ALDH1A1
SCHEMBL8760585 0.75 CYP1A2 (0.41) TAAR1CYP3A4TDP1HSD17B10ALDH1A1
SCHEMBL8896647 0.75 ALDH1A1 (0.41) TAAR1CYP3A4TDP1HSD17B10ALDH1A1
SCHEMBL23045905 0.73 NCOA1 (0.42) TAAR1CYP3A4TDP1HSD17B10ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2021085072-A1 PATTERN FORMING METHOD, PHOTOSENSITIVE RESIN COMPOSITION, LAYERED BODY MANUFACTURING METHOD, AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD 富士フイルム株式会社 2021-05-06 WO disclosed
WO-2021039841-A1 METHOD FOR PRODUCING CURED FILM, PHOTOCURABLE RESIN COMPOSITION, METHOD FOR PRODUCING LAMINATE, AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE 富士フイルム株式会社 2021-03-04 WO disclosed